2013
DOI: 10.7567/jjap.52.062101
|View full text |Cite
|
Sign up to set email alerts
|

Ga(In)N Photonic Crystal Light Emitters with Semipolar Quantum Wells

Abstract: We present directional photonic crystal light emitters produced as periodic semipolar GaInN quantum wells, grown by selective area metal organic vapour phase epitaxy. The emitted angle-dependent modal structure for sub-micrometer stripes and embedded photonic crystal structures is analyzed experimentally in detail, and the introduction of an Al0.12Ga0.88N cladding layer is investigated. We provide a complete simulation based on the finite-difference time-domain method, which allows to identify all leaky modes … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
6
0

Year Published

2015
2015
2015
2015

Publication Types

Select...
4

Relationship

4
0

Authors

Journals

citations
Cited by 4 publications
(6 citation statements)
references
References 32 publications
0
6
0
Order By: Relevance
“…All dimensions must be restricted to a few hundred nanometers, beyond the limitations of conventional optical lithography. Previously, we have reported on nanostructuring for selective area epitaxy based on laser interference lithography (LIL) for LED [17] and photonic crystal applications [18]. However, the LIL samples still suffered from mask irregularities and the structured area was limited to some cm 2 , which is why an alternative structuring method was used as described in the following.…”
Section: Selective Growth For Semipolar Quantum Wellsmentioning
confidence: 99%
“…All dimensions must be restricted to a few hundred nanometers, beyond the limitations of conventional optical lithography. Previously, we have reported on nanostructuring for selective area epitaxy based on laser interference lithography (LIL) for LED [17] and photonic crystal applications [18]. However, the LIL samples still suffered from mask irregularities and the structured area was limited to some cm 2 , which is why an alternative structuring method was used as described in the following.…”
Section: Selective Growth For Semipolar Quantum Wellsmentioning
confidence: 99%
“…A major challenge was the patterning of the mask layer. First attempts using laser interference lithography following a Lloyd's mirror arrangement () resulted in periods around 220 nm, for which strong resonance effects could be observed (). However, these structures suffered from limited stripe to stripe uniformity and other lithography irregularities (Fig.…”
Section: Sub‐micrometer Structuresmentioning
confidence: 99%
“…In the final step, the active region was capped with p‐doped GaN resulting in a homogeneous and planar surface. Further information on growth conditions and processing can be found in .…”
Section: Sample Growthmentioning
confidence: 99%
“…For conventional device processing a planarization of the surface is favorable. To achieve the planarization of the three‐dimensional structures a shrinking of the semipolar active region to nanometer scale is essential .…”
Section: Introductionmentioning
confidence: 99%