Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019 2019
DOI: 10.1117/12.2514790
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Gas permeable mold for defect reduction in nanoimprint lithography

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“…Nanoimprint lithography (NIL) is a high resolution (more than 10 nm) and high efficiency lithography technique that employs a patterning technology that involves the deposition and exposure of a low viscosity resist onto a substrate [82]. This process utilises capillary action in which the fluid quickly flows into the lowered pattern mask and the resist will be exposed under UV light for curing.…”
Section: Nanoimprint Lithographymentioning
confidence: 99%
“…Nanoimprint lithography (NIL) is a high resolution (more than 10 nm) and high efficiency lithography technique that employs a patterning technology that involves the deposition and exposure of a low viscosity resist onto a substrate [82]. This process utilises capillary action in which the fluid quickly flows into the lowered pattern mask and the resist will be exposed under UV light for curing.…”
Section: Nanoimprint Lithographymentioning
confidence: 99%