1978
DOI: 10.1351/pac197850050435
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Gas phase diffusion and surface reactions in the chemical vapour deposition of silicon

Abstract: -In semiconductor technology silicon is widely used as a start~ng material for the production of a great number of devices ranging from complicated integrated circuits to cheap solar cells. In this technology the chemical vapour deposition (CVD) of silicon plays the important role of providing the thin silicon layer in which the active devices are formed. In the growth of silicon from the vapour phase the main methods used are the hydrogen reduction of silicon halides such as SiCl4 or SiHCl3, or the decomposit… Show more

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