2016 IEEE Bipolar/BiCMOS Circuits and Technology Meeting (BCTM) 2016
DOI: 10.1109/bctm.2016.7738942
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Ge-on-insulator lateral bipolar transistors

Abstract: We report the first demonstration of thin-base symmetric lateral NPN bipolar transistors built on 8-inch Ge-on insulator (Ge-OI) wafers. A Ge-OI device can achieve the same collector current as a Si-OI device but at -460 mV lower V/JE due to the bandgap of Ge being 460 meV smaller than that of Si.Lower operation voltage should translate directly into lower power dissipation. CMOS-like process was used to fabricate lateral Ge-OI bipolar transistors. The measured collector and base currents are examined and comp… Show more

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Cited by 1 publication
(4 citation statements)
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“…We are able to achieve the same collector current, say @ I C ≈ 2 μA/μm with an ∼320 mV smaller V BE by a device with a pure Ge base and an ∼158 mV smaller V BE by a device with 0.3Ge base with respect to the linearly graded SiGe base. This observation proves the scaling of V BE with E g of the base material …”
Section: Simulated Results and Discussionsupporting
confidence: 73%
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“…We are able to achieve the same collector current, say @ I C ≈ 2 μA/μm with an ∼320 mV smaller V BE by a device with a pure Ge base and an ∼158 mV smaller V BE by a device with 0.3Ge base with respect to the linearly graded SiGe base. This observation proves the scaling of V BE with E g of the base material …”
Section: Simulated Results and Discussionsupporting
confidence: 73%
“…This observation proves the scaling of V BE with E g of the base material. 32 We also observe that at same V BE , the I B of the device with pure Ge base is shifted to the left the most. This is followed by a device with 0.3Ge base with respect to the device with a graded SiGe base.…”
Section: Acs Applied Electronic Materialsmentioning
confidence: 51%
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