Generation of 3D nanopatterns with smooth surfaces

Waid, Simon; Wanzenboeck, Heinz D.; Mühlberger, M.; Gavagnin, Marco; Bertagnolli, E.

doi:10.1088/0957-4484/25/31/315302

Cited by 9 publications

(4 citation statements)

References 33 publications

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“…Often the masters are made from silicon wafers using well-established silicon technology, like electron beam lithography or interference lithography combined with reactive ion etching [ 10 ], but also biological samples can be used to directly replicate bionic structures [ 4 , 25 ]. The fabrication of three-dimensional master stamps has also been achieved by focused ion beam related methods [ 26 , 27 ] or by grey scale lithography [ 28 ].…”

Section: Introductionmentioning

confidence: 99%

Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Taus

Prinz²,

Wanzenboeck

et al. 2021

Nanomaterials

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Biomimetic structures such as structural colors demand a fabrication technology of complex three-dimensional nanostructures on large areas. Nanoimprint lithography (NIL) is capable of large area replication of three-dimensional structures, but the master stamp fabrication is often a bottleneck. We have demonstrated different approaches allowing for the generation of sophisticated undercut T-shaped masters for NIL replication. With a layer-stack of phase transition material (PTM) on poly-Si, we have demonstrated the successful fabrication of a single layer undercut T-shaped structure. With a multilayer-stack of silicon oxide on silicon, we have shown the successful fabrication of a multilayer undercut T-shaped structures. For patterning optical lithography, electron beam lithography and nanoimprint lithography have been compared and have yielded structures from 10 µm down to 300 nm. The multilayer undercut T-shaped structures closely resemble the geometry of the surface of a Morpho butterfly, and may be used in future to replicate structural colors on artificial surfaces.

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Section: Introductionmentioning

confidence: 99%

Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Taus

Prinz²,

Wanzenboeck

et al. 2021

Nanomaterials

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“…X-ray lithography and ultraviolet (UV) lithography can fabricate 3D structures by using a moving photomask (moving mask x-ray [3,4] and UV lithography [5]), using a greyscale photomask (greyscale x-ray [6] and UV lithography [7,8]), or by tilting and rotating the sample stage and UV light (inclined/rotated x-ray [9,10] and UV lithography [11][12][13][14][15][16]). Focused ion beam lithography can manufacture 3D structures by direct milling [17] or atomic implantation [18]. Other methods such as nano-imprint lithography [19], holographic lithography [20] or a combination of the above methods work as well.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of circular sawtooth gratings using focused UV lithography

Karlsson

Holmberg

et al. 2016

J. Micromech. Microeng.

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This paper presents a novel micro-fabrication method using focused ultraviolet (UV) light to manufacture three-dimensional sawtooth structures in ultra-thick negative photoresist to fabricate a novel multi-prism x-ray lens. The method uses a lens to shape the UV beam instead of the photomask conventionally used in UV lithography. Benefits of this method include the ability to manufacture sawtooth structures in free form, for example in circular shapes as well as arrays of these shapes, and in resist that is up to 76 μm thick. To verify the method, initially a simple simulation based on Fourier optics was done to predict the exposure energy distribution in the photoresist. Furthermore, circular sawtooth gratings were manufactured in a 76 μm SU-8 resist. The UV lens was fabricated using electron beam lithography and then used to expose the SU-8 with UV light. This paper details the complete developed process, including pre-exposure with an e-beam and cold development, which creates stable sawtooth structures. The measured profile was compared to the ideal sawtooth and the simulation. The main discrepancy was in the smallest feature size, the sawtooth tips, which were wider than the desired structures, as would be expected by simulation.

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“…, copper, silver, and gold). − However, as new technologies require submicrometer features (<1 μm), these processes fail to produce the critical dimensions needed due to its isotropic etching nature, which contributes to loss of pattern conformity, ultimately leading to faulty or noncompliant devices . On the other hand, dry etching methods using plasma have the advantages of generating anisotropic etching profiles as well as enhanced etching rates, − providing the opportunity to pattern features of hundreds and in some cases even tens of nanometers.…”

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confidence: 99%

Generating Multiscale Gold Nanostructures on Glass without Sidewall Deposits Using Minimal Dry Etching Steps

et al. 2019

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The advent of recent technologies in the nanoscience arena requires new and improved methods for the fabrication of multiscale features (e.g., from micro-to nanometer scales). Specifically, biological applications generally demand the use of transparent substrates to allow for the optical monitoring of processes of interest in cells and other biological materials. Whereas wet etching methods commonly fail to produce essential nanometer scale features, plasma-based dry etching can produce features down to tens of nanometers. However, dry etching methods routinely require extreme conditions and extra steps to obtain features without residual materials such as sidewall deposits (veils). This work presents the development of a gold etching process with gases that are commonly used to etch glass. Our method can etch gold films using reactive ion etching (RIE) at room temperature and mild pressure in a trifluoromethane (CHF 3 )/oxygen (O 2 ) environment, producing features down to 50 nm. Aspect ratios of 2 are obtainable in one single step and without sidewall veils by controlling the oxygen present during the RIE process. This method generates surfaces completely flat and ready for the deposition of other materials. The gold features that were produced by this method exhibited high conductivity when carbon nanotubes were deposited on top of patterned features (gold nanoelectrodes), hence demonstrating an electrically functional gold after the dry etching process. The production of gold nanofeatures on glass substrates would serve as biocompatible, highly conductive, and chemically stable materials in biological/biomedical applications.

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Generation of 3D nanopatterns with smooth surfaces

Cited by 9 publications

References 33 publications

Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Fabrication of circular sawtooth gratings using focused UV lithography

Generating Multiscale Gold Nanostructures on Glass without Sidewall Deposits Using Minimal Dry Etching Steps

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