Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies

Wilson, Daniel W.; Rudolf, Denis; Weier, Christian; Adam, Roman; Winkler, G.; Frömter, Robert; Danylyuk, Serhiy; Bergmann, K.; Grützmacher, Detlev; Schneider, Claus M.; Juschkin, Larissa

doi:10.1063/1.4897491

Cited by 17 publications

(5 citation statements)

References 30 publications

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“…The method is utilising non-polarized radiation emitted by the source making full use of the available radiation power. In the future analytic posibilites of the approach can be extended by introduction of a broadband linear polarizer [13] or a circular polarizer [14].…”

Section: Contributedmentioning

confidence: 99%

Multi‐angle spectroscopic extreme ultraviolet reflectometry for analysis of thin films and interfaces

Danylyuk

Herbert

Loosen

et al. 2015

Phys. Status Solidi C

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Modern nanotechnology is constantly raising demands to quality and purity of thin films and interlayer interfaces. As thicknesses of employed layers decrease to single nanometers, traditional characterization tools are no longer able to satisfy throughput, precision or non-destructibility requirements. Extreme ultraviolet (EUV) and soft X-ray reflectometry has not only demonstrated the ability to detect sub-nm thickness variations but also was shown to be very sensitive to chemical composition changes. Since the laboratory radiation sources in this wavelength range often emit in a relatively broad spectral range, a spectroscopic EUV reflectometry has been developed with the added benefit of a rapid measuring time on the order of milliseconds to seconds. In this paper, the extension of the method to multi-angle measurements will be presented. It allows to reduce a number of fit parameters in the analysis model, making the method suitable for complex samples of unknown composition. First experimental examples for Si-based layer systems measured under grazing incidence angles between 2° and 15° will be demonstrated and discussed

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Section: Contributedmentioning

confidence: 99%

Multi‐angle spectroscopic extreme ultraviolet reflectometry for analysis of thin films and interfaces

Danylyuk

Herbert

Loosen

et al. 2015

Phys. Status Solidi C

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“…This enables even small scale laboratories and universities to obtain CDI with EUV light. Apart from CDI, DPP-EUV sources were already successfully employed for lithography [10][11][12] ,spectroscopy 13,14 , reflectometry 15 , scatterometry and microscopy 16-18 . aft In this article, we have demonstrated CDI of a complex valued object at 17.3 nm wavelength (Oxygen VI 3d-2p spectral line). The photon flux of the source was estimated to be larger than 13 10 3⋅…”

Section: Introductionmentioning

confidence: 99%

Employing partially coherent, compact gas-discharge sources for coherent diffractive imaging with extreme ultraviolet light

et al. 2015

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Coherent diffractive imaging (CDI) and related techniques enable a new type of diffraction-limited high-resolution extreme ultraviolet (EUV) microscopy. Here, we demonstrate CDI reconstruction of a complex valued object under illumination by a compact gas-discharge EUV light source emitting at 17.3 nm (O VI spectral line). The image reconstruction method accounts for the partial spatial coherence of the radiation and allows imaging even with residual background light. These results are a first step towards laboratory-scale CDI with a gas-discharge light source for applications including mask inspection for EUV lithography, metrology and astronomy

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“…In the EUV range, many abundant elements' emission lines are found, thus making the EUV critical for spectroscopic studies, both terrestrial and celestial [1]- [3]. In the last two decades, EUV radiation has been utilized for scatterometry of nanostructures [4], [5], microscopy [7], ptychography [6], Magnetic Circular Dichroism (MCD) studies apart from other fields [8], [9]. In 2010, ASML's Extreme Ultraviolet Lithography (EUVL) systems using a wavelength of 13.5 nm with a Numerical Aperture (NA) of 0.25 were introduced [10].…”

Section: Introductionmentioning

confidence: 99%

Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks

Saadeh

Mesilhy²,

Soltwisch

et al. 2022

Photomask Technology 2022

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The interaction of matter and light can be described based on optical constants, shortly called δ&β. These constants provide the fundamental basis for the design of any optical system. In the Extreme Ultraviolet (EUV) spectral range, however, the existing data for many materials or compounds is very sparse, non-existent or exhibit considerable discrepancies between different sources. This is further complicated since the scaling effects stipulate the optical response of a thin film to differ from bulk. Oxidation, impurities or interdiffusion significantly affect the optical response of a system to EUV radiation. For this reason, the Physikalisch-Technische Bundesanstalt (PTB) is establishing a new database in cooperation with other European partners. This database, designated as the Optical Constants Database (OCDB) can be accessed online freely (OCDB.ptb.de). This data collection shall support further development of various fields from new metrological techniques, like EUV scatterometry to computational lithography in the EUV. This is demonstrated exemplarily here by the interplay between δ&β and the dimensional parameters with respect to a structured TaTeN EUV photomask. It is equally important either direction, to derive structure parameters from the measured EUV scattering as vice versa to predict the EUV response from the geometrical structure. In addition, the impact of varying δ and β on the expected imaging performance will be investigated by simulating typical lithographic image metrics like Critical Dimension (CD), best focus position, image contrast (NILS) and non-telecentricity for the imaging of through pitch L/S and 16 nm vertical Lines with 32 nm pitch in a NA=0.55 scanner for TaTeN mask absorber as typical representatives of high-k absorber materialsand as an example of the effect on imaging simulation.

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Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies

Cited by 17 publications

References 30 publications

Multi‐angle spectroscopic extreme ultraviolet reflectometry for analysis of thin films and interfaces

Multi‐angle spectroscopic extreme ultraviolet reflectometry for analysis of thin films and interfaces

Employing partially coherent, compact gas-discharge sources for coherent diffractive imaging with extreme ultraviolet light

Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks

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