A simple, clean, and efficient method has been developed for generating hydroxyl radicals on a nitrocellulose membrane (NCM) under light of wavelengths greater than 280 nm. Hydroxyl radicals formed on the NCM surface, diffusing into the bulk solution under irradiation. Radical generation was shown to be dependent on the nature of the NCM and light, and independent of the properties of the bulk solution. The quantum yield for hydroxyl radicals from the NCM was 1.72×10 , which is approximately 2.46 times that from TiO . This hydroxyl radical generation method was preliminarily applied in the photodegradation of organic pollutants, in which electrostatic interactions between the pollutant molecules and the NCM surface were found to play a key role. Further applications of this hydroxyl radical generation method should be assessed.