Genetic-Based Active Disturbance Rejection Controller for Super-Heated Steam Temperature Regulation

In this study, wafer cleaning equipment was designed and fabricated using the induction heating (IH) method and a short-time superheated steam (SHS) generation process. To prevent problems arising from the presence of particulate matter in the fluid flow region, pure grade 2 titanium (Ti) R50400 was used in the wafer cleaning equipment for heating objects via induction. The Ti load was designed and manufactured with a specific shape, along with the resonant network, to efficiently generate high-temperature steam by increasing the residence time of the fluid in the heating object. The IH performance of various shapes of heating objects made of Ti was analyzed and the results were compared. In addition, the heat capacity required to generate SHS was mathematically calculated and analyzed. The SHS heating performance was verified by conducting experiments using the designed 2.2 kW wafer cleaning equipment. The performance of the proposed pure Ti-based SHS generation system was found to be satisfactory, and SHS with a temperature higher than 200 °C was generated within 10 s using this system.

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Genetic-Based Active Disturbance Rejection Controller for Super-Heated Steam Temperature Regulation

Cited by 2 publications

References 4 publications

A hybrid receding horizon optimization and active disturbance rejection control of boiler superheated steam temperature

A hybrid receding horizon optimization and active disturbance rejection control of boiler superheated steam temperature

Optimal Design of High-Frequency Induction Heating Apparatus for Wafer Cleaning Equipment Using Superheated Steam

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