2007
DOI: 10.1109/lpt.2007.893573
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Geometry Dependence of CMOS-Compatible, Polysilicon, Leaky-Mode Photodetectors

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Cited by 12 publications
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“…13 except that MOSFETs were fabricated in the substrate and the SiN core waveguides were laterally defined by two etched trenches, as shown in Fig. 3(a), from the passivation layer placed on the top surface of the wafer.…”
Section: Methodsmentioning
confidence: 99%
“…13 except that MOSFETs were fabricated in the substrate and the SiN core waveguides were laterally defined by two etched trenches, as shown in Fig. 3(a), from the passivation layer placed on the top surface of the wafer.…”
Section: Methodsmentioning
confidence: 99%