Advanced Photonic Sciences 2012
DOI: 10.5772/25662
|View full text |Cite
|
Sign up to set email alerts
|

Germanium-on-Silicon for Integrated Silicon Photonics

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
5
0

Year Published

2016
2016
2020
2020

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(5 citation statements)
references
References 93 publications
(90 reference statements)
0
5
0
Order By: Relevance
“…In the simulations we have assumed W = 900 nm, h 1 = 220 nm, H i = 1300 nm, τ n = τ p = 7.8 ns, and Δ E t = 0.25 and 0.135 eV in the multiplication layer and at the GeSn/Si interface (threading dislocation), respectively. According to ref , the traps at the GeSn/Si interface, induced by the threading dislocations, can be characterized by a cross section σ = 1 × 10 –15 cm 2 and N L = 10 7 cm –1 . The curves clearly indicate the avalanche effect with V br estimated as 45 V. In Figure a, the case related to Ge on Si with N T = 10 6 cm –2 is included for comparison.…”
Section: Spad Simulation Resultsmentioning
confidence: 99%
“…In the simulations we have assumed W = 900 nm, h 1 = 220 nm, H i = 1300 nm, τ n = τ p = 7.8 ns, and Δ E t = 0.25 and 0.135 eV in the multiplication layer and at the GeSn/Si interface (threading dislocation), respectively. According to ref , the traps at the GeSn/Si interface, induced by the threading dislocations, can be characterized by a cross section σ = 1 × 10 –15 cm 2 and N L = 10 7 cm –1 . The curves clearly indicate the avalanche effect with V br estimated as 45 V. In Figure a, the case related to Ge on Si with N T = 10 6 cm –2 is included for comparison.…”
Section: Spad Simulation Resultsmentioning
confidence: 99%
“…Due to its inherent properties of superior carrier mobilities, low band-gap and compatibility with silicon processes, Ge is regarded as one of the most promising materials for a broad range of applications like new-generation of complementarymetal oxide semiconductors (CMOS) [1], high-efficiency multijunction solar cells [2], low-cost thermophotovoltaic (TPV) devices [3,4] or High-Purity Ge [5] and infrared (IR) detectors [6]. In addition, the possibility of behaving as a pseudo direct bandgap material when subjected to high tensile strain and high n-type doping (>10 19 cm −3 ) [7,8] has opened the door to some other potential applications in the fields of spintronics [9], IR emitting lasers [10,11] and LEDs [12,13].…”
Section: Introductionmentioning
confidence: 99%
“…In order to meet the unprecedented demands for advanced highspeed semiconductor devices, silicon-based materials such as siliconon-insulator (SOI) and silicon on sapphire (SOS) substrates have attracted considerable interest due to significant transformation of their optical and electrical properties caused by quantum-confinement effects. Silicon is an excellent material system for optical confinement and wave transmission in the near infrared range 1 and SiO 2 has good compatibility with the existing CMOS technology for microelectronics and photonics. 2 High quality Ge crystals have been used for highly sensitive near-infrared (NIR) photodetectors in the radiation wavelength of 1300-1600 nm, 3 and exhibit significant absorption in the telecommunication wavelengths range.…”
Section: Introductionmentioning
confidence: 99%