Giant magnetoresistance in multilayers electrodeposited on n-Si

O'Keeffe, AP; Kasyutich, O. I.; Schwarzacher, Walther; Oliveira, LS De; Pasa, A. A.

doi:10.1063/1.122066

Cited by 49 publications

(35 citation statements)

References 10 publications

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“…In the last three decades, the study of the magnetic properties of nanostructured magnetic films and multilayers such as CoPt, Co-Pd, Co-Cu has revealed interesting properties such as giant magnetoresistance (GMR) and perpendicular magnetic anisotropy (PMA) [1][2][3][4][5][6]. The usefulness and development of this kind of films is due to the high-tech applications, mainly the potential applicability to high-density recording media and sensors.…”

Section: Introductionmentioning

confidence: 99%

Influence of saccharin on morphology and properties of cobalt thin films electrodeposited over n-Si(100)

Manhabosco

Müller

2008

Surface and Coatings Technology

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Section: Introductionmentioning

confidence: 99%

Influence of saccharin on morphology and properties of cobalt thin films electrodeposited over n-Si(100)

Manhabosco

Müller

2008

Surface and Coatings Technology

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“…Very recently this technique has been employed in the production of metallic nanostructures with very interesting magnetic, mechanical and thermal properties [1][2][3][4]. It is our aim to use electrodeposition in the production of thin bilayers of constantan/Cu (constantan is a solid solution of 47 wt% Ni in Cu), in order to substantially improve the sensitivity of planar heat sensors.…”

Section: Introductionmentioning

confidence: 99%

Cu-Ni Thin Films Electrodeposited on Si: Composition and Current Efficiency

Sartorelli

Schervenski

Delatorre

et al. 2001

phys. stat. sol. (a)

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Subject classification: 68.55.Jk; 68.55.Nq; S1.2; S1.3Constantan/Cu bilayers were electrodeposited potentiostatically at room temperature from a citrate electrolyte containing both copper and nickel sulfates. RBS and EDS techniques were used to determine bath efficiency, growth rate and layer composition as a function of deposition voltage. It is shown that the layer composition can be controlled by the applied potential (relative to a saturated calomel electrode (SCE)), being very sensitive to it, and may range from pure copper (at --0.45 V/SCE) up to a solid solution of 20 wt% Cu in Ni (at --1.2 V/SCE). Current efficiencies were also dependent on the applied potential, decreasing continuously from around 80% at --0.45 V/SCE, down to less than 10% for potentials more negative than --1.45 V/SCE. For the compositions of interest, however, i.e. 45-50 wt% Ni, current efficiencies were around 70%. Growth rates of 1.8 and 3.7 A/s for copper and constantan, respectively, were obtained.

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“…It should be noted, however, that the position, separation and relative amplitude of these peaks in most cases did not correspond to the relevant values obtained on physically deposited multilayers of related compositions. On the other hand, an initial monotonic increase of GMR magnitude which then eventually flattened off or, after a single maximum, decreased for higher spacer layer thicknesses was reported for electrodeposited multilayers such as Ni-Cu/Cu, 20,21 Co-Cu/Cu, 18,[22][23][24][25][26][27][28] Co-Ni-Cu/Cu, [29][30][31][32][33] Fe-Co-Ni-Cu/Cu, 34,35 Co-Au/Au, 36 Co-Ag/Ag 36 and for an electrodeposited spin-valve system with alternating hard and soft magnetic layers Ni 93 Fe 4 Cu 3 /Cu/Ni 78 Fe 14 Cu 8 /Cu. 37 The appearance or absence of a plateau or a maximum was dependent mainly on the maximum spacer layer thickness investigated and the position of the plateau region or the maximum varied from study to study, the maximum position being at around 1 to 2 nm for Ni-Cu/Cu, Co-Au/Au and Co-Ag/Ag and around 3 to 6 nm for CoCu/Cu and Co-Ni-Cu/Cu.…”

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Giant magnetoresistance in electrodeposited Co-Cu/Cu multilayers: Origin of the absence of oscillatory behavior

et al. 2009

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─ A detailed study of the evolution of the magnetoresistance was performed on electrodeposited Co/Cu multilayers with Cu layer thicknesses ranging from 0.5 nm to 4.5 nm. For thin Cu layers (up to 1.5 nm), anisotropic magnetoresistance (AMR) was observed whereas multilayers with thicker Cu layers exhibited clear giant magnetoresistance (GMR) behaviour. The GMR magnitude increased up to about 3.5 to 4 nm Cu layer thickness and slightly decreased afterwards. According to magnetic measurements, all samples exhibited ferromagnetic (FM) behaviour. The relative remanence turned out to be about 0.75 for both AMR and GMR type multilayers. This clearly indicates the absence of an antiferromagnetic (AF) coupling between adjacent magnetic layers for Cu layers even above 1.5 nm where the GMR effect occurs. The AMR behaviour at low spacer thicknesses indicates the presence of strong FM coupling (due to, e.g., pin-holes in the spacer and/or areas of the Cu layer where the layer thickness is very small). With increasing spacer thickness, the pin-hole density reduces and/or the layer thickness uniformity improves which both lead to a weakening of the FM coupling. This improvement in multilayer structure quality results in a better separation of magnetic layers and the weaker coupling (or complete absence of interlayer coupling) enables a more random magnetization orientation of adjacent layers, all this leading to an increase of the GMR. Coercive field and zero-field resistivity measurements as well as the results of a structural study reported earlier on the same multilayers provide independent evidence for the microstructural features established here. A critical analysis of former results on electrodeposited Co/Cu multilayers suggests the absence of an oscillating GMR in these systems. It is pointed out that the large GMR reported previously on such Co/Cu multilayers at Cu layer thicknesses around 1 nm can be attributed to the presence of a fairly large superparamagnetic (SPM) fraction rather than being due to a strong AF coupling. In the absence of SPM regions as in the present study, AMR only occurs at low spacer thicknesses due to the dominating FM coupling.

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Giant magnetoresistance in multilayers electrodeposited on n-Si

Cited by 49 publications

References 10 publications

Influence of saccharin on morphology and properties of cobalt thin films electrodeposited over n-Si(100)

Influence of saccharin on morphology and properties of cobalt thin films electrodeposited over n-Si(100)

Cu-Ni Thin Films Electrodeposited on Si: Composition and Current Efficiency

Giant magnetoresistance in electrodeposited Co-Cu/Cu multilayers: Origin of the absence of oscillatory behavior

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