Glow discharge optical emission spectrometry: moving towards reliable thin film analysis–a short review

Angeli, J.; Bengtson, Arne; Bogaerts, Annemie; Hoffmann, Volker; Hodoroabă, Vasile-Dan; Steers, Edward B. M.

doi:10.1039/b301293j

Cited by 90 publications

(50 citation statements)

References 47 publications

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“…These characteristics are mainly achieved due to nonpreferential sputtering rates with low energetic Ar ions, and due to spatial and temporal separation of the atomization process from the ionization processes. Therefore, quantification without typically required matrix-matched calibration standards is possible (Angeli et al, 2003;Hoffmann et al, 2005). Nevertheless, restricted lateral resolution (approximately mm) and specific requirements on shape and dimensions of the sample have been reported (Nelis & Pallosi, 2006).…”

Section: A State-of-the-art Surface Methods For Depth Profilingmentioning

confidence: 99%

Femtosecond laser ablation inductively coupled plasma mass spectrometry: Fundamentals and capabilities for depth profiling analysis

Pisonero

Günther

2008

Mass Spectrometry Reviews

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Laser ablation coupled to inductively coupled plasma mass spectrometry has become a versatile and powerful analytical method for direct solid analysis. The applicability has been demonstrated on a wide variety of samples, where major, minor, and trace element concentrations or isotope ratio determinations have been of interest. The pros and cons of UV-nsec laser ablation have been studied in detail, and indicate that aerosol generation, aerosol transport, and aerosol excitation-ionization within the ICP contribute to fractionation effects, which prevent this method from a more universal application to all matrices and all elements. Recent progresses in IR-fs and UV-fs laser ablation coupled to ICP-MS have been reported, which increase the inter-matrix and multi-element quantification capabilities of this method. These fundamental improvements in LA-ICP-MS are of significant importance for entering new applications in material science and related research fields. In particular, because coatings (conducting and non-conducting) consist of single or multilayers of various elemental composition and of different thickness (nm-mm range), significant progress in the field of depth profiling with fs-laser ablation can be expected. Therefore, in-depth profile analysis of polymers, semiconductors, and metal sample investigations, using ultra-fast laser ablation for sampling and the currently achievable figures of merit, are discussed. In this review manuscript, the enhanced capabilities of fs-LA-ICP-MS for direct solid sampling are highlighted, and it is discussed about current methods used for quantitative analysis and depth profiling, the ablation process of UV-ns and UV-fs, the influence of the laser beam profile, aerosol structure and transport efficiency, as well as the influence of the ICP-MS (e.g., vaporization and ionization efficiency in the plasma, and type of mass analyzer).

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Section: A State-of-the-art Surface Methods For Depth Profilingmentioning

confidence: 99%

Femtosecond laser ablation inductively coupled plasma mass spectrometry: Fundamentals and capabilities for depth profiling analysis

Pisonero

Günther

2008

Mass Spectrometry Reviews

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“…Angeli et al [8] have demonstrated that layers of nm thickness can be detected routinely nowadays (see also figure 3). The analysis of layers in a multilayer stack can also be carried out with the same resolution as obtained in more traditional methods of layer analysis, but in a much shorter time and therefore at lower cost, and to greater depths.…”

Section: Later Developmentsmentioning

confidence: 99%

The effects of traces of molecular gases (H₂, N₂& O₂) in glow discharges in noble gases

Steers

Šmı́d

Hoffmann

et al. 2008

J. Phys.: Conf. Ser.

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“…[4,6] The easy application of GD-OES is caused by the experimental simplicity and high sample throughput for analysis (no ultrahigh vacuum is required). One of the main advantages of this method is indicated by a multielement determination in solids.…”

Section: Introductionmentioning

confidence: 99%

Analysis of interface impurities in electroplated Cu layers by using GD‐OES and TOF‐SIMS

Klemm

Stangl

Peeva³

et al. 2008

Surface & Interface Analysis

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Electrochemically deposited (ECD) copper layers used as interconnect metallizations exhibit incorporated impurities in the form of H, S, C, O, N, and Cl originating from additives in the electrolyte solution. These impurities were observed in the whole layer and especially at the interface to the underlying Cu seed layer due to an increased adsorption at the beginning of the electroplating process. Time-of-flight (TOF)-SIMS and glow discharge optical emission spectroscopy (GD-OES) were carried out for interface analysis of 100-nmECD thin Cu films plated on a 50-nm Cu seed layer deposited by physical vapor deposition (PVD). This reveals the respective advantages and disadvantages of both techniques for thin film analysis. Also the effect of a modification of the electroplating procedure is shown. This so-called Hot Start Plating inhibits the additive adsorption and decreases the undesirable incorporation of impurities.

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Glow discharge optical emission spectrometry: moving towards reliable thin film analysis–a short review

Cited by 90 publications

References 47 publications

Femtosecond laser ablation inductively coupled plasma mass spectrometry: Fundamentals and capabilities for depth profiling analysis

Femtosecond laser ablation inductively coupled plasma mass spectrometry: Fundamentals and capabilities for depth profiling analysis

The effects of traces of molecular gases (H₂, N₂& O₂) in glow discharges in noble gases

Analysis of interface impurities in electroplated Cu layers by using GD‐OES and TOF‐SIMS

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Glow discharge optical emission spectrometry: moving towards reliable thin film analysis–a short review

Cited by 90 publications

References 47 publications

Femtosecond laser ablation inductively coupled plasma mass spectrometry: Fundamentals and capabilities for depth profiling analysis

Femtosecond laser ablation inductively coupled plasma mass spectrometry: Fundamentals and capabilities for depth profiling analysis

The effects of traces of molecular gases (H2, N2& O2) in glow discharges in noble gases

Analysis of interface impurities in electroplated Cu layers by using GD‐OES and TOF‐SIMS

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The effects of traces of molecular gases (H₂, N₂& O₂) in glow discharges in noble gases