Gold-implanted shallow conducting layers in polymethylmethacrylate

Abstract

Characterization of bias stress induced electrical instability in liquid-crystalline semiconducting polymer thin-film transistors J. Appl. Phys. 110, 084511 (2011) Influence of crystallization-induced amorphous phase confinement on -and -relaxation molecular mobility in parylene F J. Appl. Phys. 110, 063703 (2011) Variability of physical characteristics of electro-sprayed poly(3-hexylthiophene) thin films J. Appl. Phys. 110, 054515 (2011) Metallic-like conduction in Co-phthalocyanine/Fe-phthalocyanine composite films grown on sapphire substrates Appl. Phys. Lett. 99, 112102 (2011) Theoretical study of substitution effects on molecular reorganization energy in organic semiconductors J. Chem. Phys. 135, 104703 (2011) Additional information on J. Appl. Phys. PMMA ͑polymethylmethacrylate͒ was ion implanted with gold at very low energy and over a range of different doses using a filtered cathodic arc metal plasma system. A nanometer scale conducting layer was formed, fully buried below the polymer surface at low implantation dose, and evolving to include a gold surface layer as the dose was increased. Depth profiles of the implanted material were calculated using the Dynamic TRIM computer simulation program. The electrical conductivity of the gold-implanted PMMA was measured in situ as a function of dose. Samples formed at a number of different doses were subsequently characterized by Rutherford backscattering spectrometry, and test patterns were formed on the polymer by electron beam lithography. Lithographic patterns were imaged by atomic force microscopy and demonstrated that the contrast properties of the lithography were well maintained in the surface-modified PMMA.

Structure of disordered gold-polymer thin films using small angle x-ray scattering

“…In previous work, we have investigated the subplanted material using transmission electron microscopy ͑TEM͒ and we have found 16 below the surface. We have also carried out Monte-Carlo computer simulations of low energy implantation and found 13 good agreement with the TEM data. We made three different samples using three different implanted gold ion doses, chosen according to the electrical characteristics 10,13 of the PMMA/gold materials that show different behavior at different doses.…”

“…Ion implantation was done using a repetitively pulsed cathodic arc plasma gun, described in detail elsewhere, 10,13,16,29,30 which produces a unidirectional stream of fully ionized metal plasma ͑in this case gold plasma͒ in pulses of duration 5 ms at a repetition rate of 1 Hz. Base pressure in the vacuum chamber was 6 ϫ 10 −6 Torr ͑ϳ8 ϫ 10 −4 Pa͒.…”

“…7,8 In the work described here, we have used SAXS and the appropriate theoretical models [4][5][6][7][8][9] to determine the disordered structure of polymethylmethacrylate ͑PMMA͒-Au composite films. These kinds of composites possess interesting and technologically important electrical, [10][11][12] lithographic, 13 and optical properties. 11,12,14,15 The films investigated here were made by implanting gold ions at very low energy ͑about 49 eV͒ into PMMA polymer; ͑very low energy ion implantation is often referred to as "subplantation," and this is the appropriate terminology here͒.…”

Cell adhesion and growth on surfaces modified by plasma and ion implantation

“…16 Silver nanoparticles are known for their antibacterial properties. 17 As it is known that implantation of metal into polymer using ion implantation forms nanoparticles inside the polymer, [18][19][20][21][22][23][24][25][26] we evaluated the cell growth on buried silver nanoparticles into SU-8 formed by ion implantation. PDMS is a widely used polymeric material with several interesting characteristics, which include high flexibility, optical transparency, biocompatibility, and ease to fabricate.…”

Testes e aplicação de um novo implantador iônico.

“…Os métodos físicos incluem a ablação por laser, deposição química a vapor, fluidos supercríticos dentre outros [39]. A implantação iônica também tem sido utilizada para gerar camada de nanocompósito alguns nanômetros abaixo da superfície do substrato [12,[40][41][42][43][44][45][46][47][48][49][50][51][52][53][54]. Como já mencionado no Capítulo 2, a formação das nanopartículas metálicas se dá espontaneamente e pode ser explicada pela ocorrência de concentração dos átomos metálicos acima do limite de solubilidade no substrato implantado, levando à nucleação e crescimento das nanopartículas metálicas [27].…”