2007
DOI: 10.1109/lpt.2007.908659
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Gradient Doping of Mg in p-Type GaN for High Efficiency InGaN–GaN Ultraviolet Light-Emitting Diode

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Cited by 23 publications
(10 citation statements)
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“…Interestingly, such parasitic emission at 385 nm was observed by other groups from Ga-and non-polar MQWs with EBL incorporated LEDs, which had been attributed to radiative recombination due to overflowing (or tunneling) electrons from the active region to p-type GaN layers. [31][32][33] However, the DQW LED did not exhibit the 385 nm peak even at higher current densities up to 400 A/cm 2 (Fig. 2(b)).…”
mentioning
confidence: 93%
“…Interestingly, such parasitic emission at 385 nm was observed by other groups from Ga-and non-polar MQWs with EBL incorporated LEDs, which had been attributed to radiative recombination due to overflowing (or tunneling) electrons from the active region to p-type GaN layers. [31][32][33] However, the DQW LED did not exhibit the 385 nm peak even at higher current densities up to 400 A/cm 2 (Fig. 2(b)).…”
mentioning
confidence: 93%
“…It is also feasible to increase the lateral current flow by increasing the p-GaN layer thickness (t p ). Furthermore, the PNPNP-GaN will not have very abrupt interfaces because of the dopant diffusion, especially the Mg diffusion [39]. However, one still can maintain the PNPNP-GaN junctions by properly increasing the Si doping concentration and/or the n-GaN thickness.…”
Section: Resultsmentioning
confidence: 99%
“…[8][9][10][11][12][13][14][15] LEDs containing PC structure have been designed to efficiently couple light from the guided modes into air. 16,17 Therefore, the PC structure formed in the p-GaN layer is generally thinner than the thickness of p-GaN. [10][11][12][13][14] Forming a PC structure in the p-GaN layer requires the use of plasma dry etching, resulting in plasma damage to the p-GaN layer and sometimes even in the multiple quantum well ͑MQW͒ layer.…”
Section: Enhanced Emission Efficiency Of Gan / Ingan Multiple Quantummentioning
confidence: 99%