2012
DOI: 10.1016/j.tsf.2012.09.040
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Graphene applications in Schottky barrier solar cells

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Cited by 51 publications
(25 citation statements)
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“…25(g)), only results in the appearance of a kink, which limits the cell efficiency. L. Lancellotti et al [221] used the generalized equivalent circuit model of Fig. 5(e), with circuital parameters adapted to the physical properties of the graphene/semiconductor junction, to simulate devices made of graphene sheets with different numbers of layers L N , coupled to n-and p-type Si or Ge.…”
mentioning
confidence: 99%
“…25(g)), only results in the appearance of a kink, which limits the cell efficiency. L. Lancellotti et al [221] used the generalized equivalent circuit model of Fig. 5(e), with circuital parameters adapted to the physical properties of the graphene/semiconductor junction, to simulate devices made of graphene sheets with different numbers of layers L N , coupled to n-and p-type Si or Ge.…”
mentioning
confidence: 99%
“…Furthermore, its high conductivity makes it suitable for replacing traditional metal electrodes in diodes, which results in the formation of a Schottky contact with various semiconducting materials. 13,14 In particular, the graphene-semiconductor Schottky contact structure has recently been employed in graphene-based devices such as solar cells, [15][16][17] barristors, 18 and sensors. 19 Therefore, the investigation of Schottky contacts between graphene and semiconductors, which is the simplest but one of the most widely used structures in graphene-based devices, can be considered an important topic in graphene device application research.…”
mentioning
confidence: 99%
“…In the first method, patterned HOPG was directly pressed by hand against a piece of a silicon wafer (Semiconductor Wafer Inc.) as it is shown in Fig. 1 c. In the second method, a small drop of silicon universal glue (Bison) instead of widely used polydimethylsiloxane (PDMS) [11][12][13] was deposited onto the patterned HOPG surface and cleaved after 12 hours (Fig. 1 e).…”
Section: Methodsmentioning
confidence: 99%