Proceedings of the 13th International Symposium on Power Semiconductor Devices &Amp; ICs. IPSD '01 (IEEE Cat. No.01CH37216)
DOI: 10.1109/ispsd.2001.934616
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Great improvement in IGBT turn-on characteristics with Trench Oxide PiN Schottky (TOPS) diode

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Cited by 8 publications
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“…This approach reduces the hole injection and lowers the carrier concentration at the p-n junction side. A variation of this approach is the trench oxide PiN Schottky [51] in which the p-regions are performed at the bottom of trench cells while the Schottky contact is at the surface. In both approaches, the area of layers injecting holes is reduced and, consequently, the free carrier densities at the p-n junction side are lowered.…”
Section: Power Rectifiersmentioning
confidence: 99%
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“…This approach reduces the hole injection and lowers the carrier concentration at the p-n junction side. A variation of this approach is the trench oxide PiN Schottky [51] in which the p-regions are performed at the bottom of trench cells while the Schottky contact is at the surface. In both approaches, the area of layers injecting holes is reduced and, consequently, the free carrier densities at the p-n junction side are lowered.…”
Section: Power Rectifiersmentioning
confidence: 99%
“…Fig. 9: Schematic cross-section of the trench oxide pin Schottky diode [51] There are also other concepts for getting the desired plasma distribution without using anode structures for reducing the area of hole injection. One is based on the use of a local recombination centre profile close to the panode.…”
Section: Power Rectifiersmentioning
confidence: 99%