2020
DOI: 10.1002/chem.202003124
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Green Precursors and Soft Templating for Printing Porous Carbon‐Based Micro‐supercapacitors

Abstract: Ac ombination of soft lithographic printing and soft templating has been used to fabricate high-resolution interdigitatedm icro-supercapacitors (MSC). Surfactant-assisted self-assembly produces high surface area orderedm esoporous carbons(490 m 2 g À1). For the first time, such precursors have been printed by nano-imprint lithography as microdevices with al ine width of only 250 nm and as pacing of only 1 mm. The devices are crack-free with low specific resistance(1.2 10 À5 Wm) and show good device capacitance… Show more

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Cited by 5 publications
(3 citation statements)
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References 47 publications
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“…Finally, with the continuing innovation in manufacturing methods, there is growing demand for researchers to expand the application fields of the nanoskiving technique. In addition to the typical applications to optical devices and electrochemical devices, the use of nanostructures fabricated by nanoskiving in energy harvesting, [ 128 ] biomolecular detectors, [ 129 ] and data storage [ 130 ] applications is also attracting increasing attention. All these applications will be possible when the preparation of the nanostructures becomes more reliable and controllable with the continuous improvements being made in nanoskiving technology.…”
Section: Discussionmentioning
confidence: 99%
“…Finally, with the continuing innovation in manufacturing methods, there is growing demand for researchers to expand the application fields of the nanoskiving technique. In addition to the typical applications to optical devices and electrochemical devices, the use of nanostructures fabricated by nanoskiving in energy harvesting, [ 128 ] biomolecular detectors, [ 129 ] and data storage [ 130 ] applications is also attracting increasing attention. All these applications will be possible when the preparation of the nanostructures becomes more reliable and controllable with the continuous improvements being made in nanoskiving technology.…”
Section: Discussionmentioning
confidence: 99%
“…[64] Instead of using photoresist, Lochmann et al employed a combination of UV curing and template-assisted methods to prepare porous carbon-based MSCs. MSCs exhibit a interdigital line width of only 250 nm and a interdigital distance of 1 mm, achieving a specific capacitance of 0.21 F cm À 2 [65] . While photolithography offers clear advantages, the cumbersome process, the high cost of photoresists, together with the contamination caused by their removal from electrodes are significant barriers to the large-scale manufacture of MSCs.…”
Section: Large-scale Fabrication Of Devicementioning
confidence: 99%
“…However, the compact thin films pyrolyzed at 800 °C and 700 °C showed remarkably low specific resistances which are about three times lower than for comparable carbon precursors at those temperatures. 40 Therefore, we focused especially on pyrolysis temperatures between 700 and 900 °C for the subsequent preparation of micro-supercapacitors.…”
Section: Precursor Characterizationmentioning
confidence: 99%