present on the surface of inorganic materials, such as metals, [3] silicon dioxide, [4] or indium tin oxide (ITO). [5] This airborne contamination is known to form a layer that changes the wettability of these surfaces rendering them hydrophobic upon air exposure. [1,6] Gold is widely employed both in applied and fundamental research (e.g., optoelectronic device fabrication, adsorption studies, and electrochemical detection) and it is also a suitable material for gravitational waves detection (Gravity Probe B, [7] UV-LED, [8] and LISA Pathfinder [9] ). The control of adventitious contamination is of critical importance for the above-cited applications, as surface cleanliness and uniformity are among the key requirements to obtain reliable and reproducible results. [10] For example, in ultrahigh vacuum (UHV) environments, sputter-cleaning via ion-gun bombardment followed by thermal annealing is used to remove organic contaminants to yield clean metallic surfaces. [11] Alternatively, thin films of pure gold can also be produced in situ via thermal evaporation, [6c,12] sputtering deposition [13] or e-beam evaporation, [13a] in high vacuum (HV). If gold surfaces are processed at ambient pressure (e.g., used as a substrate for the deposition of thin films or for the adsorption of biomolecules, monolayer films, or nanoparticles) cleaning and/or pretreatment protocols are often necessary, even for freshly evaporated metals. [12] Different combinations of dry treatments (e.g., flame annealing, [14] plasma cleaning, [15] ultraviolet/ozone (UV/O 3 ), [16] and mechanical polishing [17] ) and wet treatments (e.g., rinsing and/or ultrasonication in a cleaning solvent and (electro) chemical treatments [17,18] ) are commonly employed during the early stages of sample preparation prior to further processing. Residual contamination or structural changes induced by the treatment might influence, for instance, the electrochemical response of gold, still without completely preventing its functionality. [18b] In other cases, instead, as in surface force or molecular adsorption studies done via scanning probe microscopy (SPM), [10a] a very smooth and clean surface is required. The AdC contamination usually represents the uppermost layer and its presence heavily affects the measurement of surfacesensitive physical properties; for example, Gomez-Herrero and co-workers [19] showed via Kelvin probe force microscopy (KPFM) that carbon contamination can locally change the work function (WF) of a highly oriented pyrolytic graphite (HOPG) sample (freshly cleaved in ambient air and transferred inside a