Grouping design method of catadioptric projection objective for deep ultraviolet lithography

Cao, Zhen; Li, Yanqiu; Mao, Shanshan

doi:10.1117/1.oe.56.2.025102

Cited by 5 publications

(1 citation statement)

References 16 publications

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“…The projection objective (PO) is a key component of deep ultraviolet (DUV) lithography tools [1,2] . For 22-14 nm technology nodes, a hyper-numerical-aperture (NA) PO adopts aspheric surfaces (ASPSs) [3] . When the resolution is decreased to 10-5 nm nodes, a stricter wavefront error (root mean square, RMS < 1 nm) is required [4] .…”

mentioning

confidence: 99%

Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Mao¹,

Li²,

Jiang³

et al. 2018

Chin. Opt. Lett.

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We have proposed and developed a design method of a freeform surfaces (FFSs) based hyper-numerical-aperture deep ultraviolet (DUV) projection objective (PO) with low aberration. With an aspheric initial configuration, lens-form parameters were used to determine the best position to remove elements and insert FFSs. The designed FFSs PO reduced two elements without increasing the total thickness of the glass materials. Compared with aspheric initial configuration, the wavefront error of the FFSs PO decreased from 0.006λ to 0.005λ, the distortion reduced from 1 to 0.5 nm, and the aspheric departure decreased from 1.7 to 1.35 mm. The results show that the design method of the FFSs PO is efficient and has improved the imaging performance of PO. The design method of FFSs PO provides potential solutions for DUV lithography with low aberrations at 10-5 nm nodes.

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mentioning

confidence: 99%

Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Mao¹,

Li²,

Jiang³

et al. 2018

Chin. Opt. Lett.

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Design of high-resolution long working distance double-telecentric projection lens

Chen

Zhang

Chen

2020

2020 21st International Conference on Electronic Packaging Technology (ICEPT)

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Design of an objective for a hyper-numerical-aperture immersion lithography tool with a multi-step alternative grouping design method

Yan

liu

et al. 2022

Appl. Opt.

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An adequate initial structure plays an important role in achieving a high-quality hyper-numerical-aperture (NA) catadioptric objective for an immersion lithography tool. A multi-step alternative grouping design method is innovated to achieve a feasible aspherical initial structure of the hyper-NA objective. The objective is first divided into three groups: the object-side group (G1), the middle group (G2), and the image-side group (G3), and then each group is designed separately. To guarantee the effective connection of these separate groups, G1 and G2 or G2 and G3 are connected as G12 or G32 on the object or image side with an aspherical structure. Then, through ray tracing in the forward path and the reverse path, G2 will be recalculated to a new aspherical structure, and the hybrid iterating process will be adopted to get a better G2 and to better connect the whole system. Finally, G1 and the new G2 and G3 are connected as a feasible aspherical initial structure of the hyper-NA catadioptric objective, which can be considered a good starting point for further optimization. A high-performance catadioptric objective with a hyper-NA of 1.35 was designed by the proposed method.

show abstract

Grouping design method of catadioptric projection objective for deep ultraviolet lithography

Cited by 5 publications

References 16 publications

Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Design of high-resolution long working distance double-telecentric projection lens

Design of an objective for a hyper-numerical-aperture immersion lithography tool with a multi-step alternative grouping design method

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