Growth and characterization of fluorocarbon thin films grown from trifluoromethane (CHF3) using pulsed‐plasma enhanced CVD

Winder, Edmund J.; Gleason, Karen K.

doi:10.1002/1097-4628(20001024)78:4<842::aid-app180>3.3.co;2-a

Cited by 6 publications

(12 citation statements)

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“…Several observations can be made from this result. First of all, the FTIR spectrum corresponds very well with FTIR spectra of fluoropolymers deposited under similar conditions 30 , 70 . If we consider Fig.…”

Section: Resultssupporting

confidence: 63%

Passivation of miniature microwave coplanar waveguides using a thin film fluoropolymer electret

Marzouk

Avramovic

Guérin

et al. 2021

Sci Rep

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The insertion losses of miniature gold/silicon-on-insulator (SOI) coplanar waveguides (CPW) are rendered low, stable, and light insensitive when covered with a thin film (95 nm) fluoropolymer deposited by a trifluoromethane (CHF3) plasma. Microwave characterization (0–50 GHz) of the CPWs indicates that the fluoropolymer stabilizes a hydrogen-passivated silicon surface between the CPW tracks. The hydrophobic nature of the fluoropolymer acts as a humidity barrier, meaning that the underlying intertrack silicon surfaces do not re-oxidize over time—something that is known to increase losses. In addition, the fluoropolymer thin film also renders the CPW insertion losses insensitive to illumination with white light (2400 lx)—something potentially advantageous when using optical microscopy observations during microwave measurements. Capacitance–voltage (CV) measurements of gold/fluoropolymer/silicon metal–insulator-semiconductor (MIS) capacitors indicate that the fluoropolymer is an electret—storing positive charge. The experimental results suggest that the stored positive charge in the fluoropolymer electret and charge trapping influence surface-associated losses in CPW—MIS device modelling supports this. Finally, and on a practical note, the thin fluoropolymer film is easily pierced by commercial microwave probes and does not adhere to them—facilitating the repeatable and reproducible characterization of microwave electronic circuitry passivated by thin fluoropolymer.

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Section: Resultssupporting

confidence: 63%

Passivation of miniature microwave coplanar waveguides using a thin film fluoropolymer electret

Marzouk

Avramovic

Guérin

et al. 2021

Sci Rep

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“…Third, pulsed PECVD can be used, where the power is modulated for durations of milliseconds or microseconds, and the time period during which the power is on is only a fraction of the total time 12–20. This decreases the total power delivered to the substrate, which also makes maintaining low substrate temperatures easier, particularly when using substrates of low thermal conductivity, such as textiles.…”

Section: Unifying Themesmentioning

confidence: 99%

“…In PECVD, plasma excitation of the vapor phase creates the radical species 11. However, the degree to which organic functionality is preserved often improves by decreasing the plasma power through strategies such as pulsing the plasma excitation12–20 or performing the deposition downstream of the active plasma region 11, 21, 22. Alternatively, an initiating species can be introduced through the gas phase along with the monomers.…”

Section: Introductionmentioning

confidence: 99%

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

et al. 2010

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Chemical vapor deposition (CVD) polymerization utilizes the delivery of vapor-phase monomers to form chemically well-defined polymeric films directly on the surface of a substrate. CVD polymers are desirable as conformal surface modification layers exhibiting strong retention of organic functional groups, and, in some cases, are responsive to external stimuli. Traditional wet-chemical chain- and step-growth mechanisms guide the development of new heterogeneous CVD polymerization techniques. Commonality with inorganic CVD methods facilitates the fabrication of hybrid devices. CVD polymers bridge microfabrication technology with chemical, biological, and nanoparticle systems and assembly. Robust interfaces can be achieved through covalent grafting enabling high-resolution (60 nm) patterning, even on flexible substrates. Utilizing only low-energy input to drive selective chemistry, modest vacuum, and room-temperature substrates, CVD polymerization is compatible with thermally sensitive substrates, such as paper, textiles, and plastics. CVD methods are particularly valuable for insoluble and infusible films, including fluoropolymers, electrically conductive polymers, and controllably crosslinked networks and for the potential to reduce environmental, health, and safety impacts associated with solvents. Quantitative models aid the development of large-area and roll-to-roll CVD polymer reactors. Relevant background, fundamental principles, and selected applications are reviewed.

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“…The described series of depositions were also performed at the same average power utilizing pulsed plasma enhanced CVD. Pulsed PECVD modulates the plasma power and has been shown to increase functional group retention in thin films 12,28–31. Utilizing a 10 ms on time and 90 ms off time, and a peak plasma power of 200 W results in an average power of 20 W equivalent to the continuous wave PECVD experiments previously described.…”

Section: Resultsmentioning

confidence: 99%

Chemical Vapor Deposition of Organosilicon Thin Films from Methylmethoxysilanes

Casserly

Gleason

2005

Plasma Processes & Polymers

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Summary: Plasma enhanced chemical vapor deposition was used to deposit organosilicate glass (OSG) thin films from trimethylmethoxysilane, dimethyldimethoxysilane, and methyltrimethoxysilane. Depositions were performed from the pure OSG precursor, as well as from mixtures where either oxygen or hydrogen was added to the gas feed. These films were analyzed via Fourier transform infrared spectroscopy (FTIR), variable angle spectroscopic ellipsometry (VASE), and electrical measurements. Reactions involved in the deposition of OSG thin films from methylmethoxysilanes with oxygen are not selective and lead to the undesirable loss of methyl functionality. Reducing chemistry achieved with hydrogen addition is selective, with hydrogen atoms reacting preferentially with the methoxy groups creating silanol or siloxyl radicals. This selectively forms bonds networking through condensation reactions without sacrificing the “built‐in” alkyl content of the precursor. Low‐k OSG thin films from methylmethoxysilanes and hydrogen were deposited via a low power, W/FM from 10.0 to 10.5 J/g dependent upon OSG precursor, PECVD process resulting in material dielectric constants ranging from 2.84 to 3.18.

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Growth and characterization of fluorocarbon thin films grown from trifluoromethane (CHF3) using pulsed‐plasma enhanced CVD

Cited by 6 publications

References 0 publications

Passivation of miniature microwave coplanar waveguides using a thin film fluoropolymer electret

Passivation of miniature microwave coplanar waveguides using a thin film fluoropolymer electret

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

Chemical Vapor Deposition of Organosilicon Thin Films from Methylmethoxysilanes

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