1999
DOI: 10.1557/proc-583-33
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Growth and Characterization of Inas Quantum Dots on Silicon

Abstract: Up to 1011 cm−2 InAs quantum dots (QD) can be grown on Silicon(001) by molecular beam epitaxy. This very new material system is on the one hand interesting with regard to the integration of optoelectronics with silicon technology on the other hand it offers new insight into the formation of QDs. We report on RHEED, TEM and Raman studies about (in-) coherence of the QDs and on an according to our knowledge so far unknown dewetting transition in this material system. The results are being discussed on the basis … Show more

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Cited by 3 publications
(5 citation statements)
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“…(001) substrates were hydrogenpassivated, details on their preparation and optimized growth conditions can be found in [9,10]. (001) substrates were hydrogenpassivated, details on their preparation and optimized growth conditions can be found in [9,10].…”
Section: Methodsmentioning
confidence: 99%
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“…(001) substrates were hydrogenpassivated, details on their preparation and optimized growth conditions can be found in [9,10]. (001) substrates were hydrogenpassivated, details on their preparation and optimized growth conditions can be found in [9,10].…”
Section: Methodsmentioning
confidence: 99%
“…1b). [10] on the basis of a simple thermodynamic model which mainly considers the additional strain energy to the Gibbs free energy of the heteroepitaxial system [12]. The growth mode transition is accompanied by a more and more blurred 2D RHEED image and finally a change towards a spotty 3D image.…”
Section: Methodsmentioning
confidence: 99%
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“…This phenomenon has previously been observed for MBE growth of InAs on Si. 6 Hansen et al deposited 1.5 monolayers of InAs on Si at 370°C and then cooled the sample. Below 320°C, they discovered that islands formed, and the size distribution of the islands was unusual.…”
Section: Discussionmentioning
confidence: 99%