Growth and characterization of yttrium oxide thin layers on silicon deposited by yttrium evaporation in atomic oxygen

Effects of post-deposition annealing ambient on Y2O3 gate deposited on silicon by RF magnetron sputtering

“…Deposition of Y 2 O 3 films has been done by e-beam evaporation [16,[19][20][21][22][23][24][25][26][27][28], molecular beam epitaxy [29,30], RF magnetron sputtering [31][32][33][34][35], laser ablation [36], RF sputtering [37], reactive RF sputtering [15,38], ion beam sputtering [17,36,[39][40][41], plasma-assisted chemical vapor deposition (CVD) [42,43], pulsed liquid-injection plasma-enhanced metallorganic CVD [4,44], low pressure CVD [45], atomic layer deposition [18,[46][47][48], and ionized cluster beam deposition [49,50] techniques. The quality of deposited Y 2 O 3 film may be attributed to two factors, namely crystallinity of the structure and stoichiometry of the chemical composition.…”

Enhanced photoemission from nanoscale agglomerations in Li co-activated Y2O3:Eu3+ thin films

“…It is reported [13][14][15] that even in very small quantities, Li + ions, as co-dopant, can play an important role in increasing the luminescent efficiency of bulk phosphors. Techniques like sputtering, pulsed laser deposition, vacuum evaporation, electron beam evaporation, spray pyrolysis and chemical deposition [11,[16][17][18][19][20] have been used for the preparation of yttrium based oxide thin films. Pulsed laser deposition (PLD) provides a unique process for stoichiometric evaporation of target materials and control of film morphology.…”

Structural, optical and electrical characteristics of yttrium oxide films deposited by laser ablation

“…[1][2][3][4][5][6] In particular, yttrium oxide has received some attention because of its high dielectric constant ͑13-17͒ compared with that of SiO 2 ͑3.9͒ and high resistivity and breakdown strength. 1,2 Among other materials Ta, Hf, Zr and Y oxides have been studied for this purpose.…”