We present a comprehensive study of the nucleation kinetic of Cu on Ni͑100͒ using variable-temperature scanning tunneling microscopy. The analysis of the saturation island density as a function of substrate temperature and deposition rate reveals that the smallest stable island abruptly changes from a dimer to a tetramer. From the Arrhenius plot, the migration barrier E m ϭ͑0.35Ϯ0.02͒ eV, as well as the dimer bond energy E b ϭ͑0.46Ϯ0.19͒ eV, has been deduced. For low ratios between the migration constant D and flux R (D/RϽ10 4 ), nucleation and island growth take place not only during, but also after deposition. In this postnucleation regime, the final island density and island size distribution are no more determined by the competition between flux and monomer migration, but solely by the monomer concentration present immediately after deposition. Therefore, the island density becomes independent of substrate temperature and flux, and the scaled island size distribution closely resembles that of statistic growth ͑adatom smallest stable island͒. The experimental results are compared with simulations using rate equations. ͓S0163-1829͑96͒10948-6͔