2013
DOI: 10.1149/2.070306jes
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Growth and Crystallization of Titanium Oxide Films at Different Anodization Modes

Abstract: The growth process and crystallizing mechanisms of anodic oxide films on highly pure titanium plates are studied in 0.1 M H 2 SO 4 solution at potentiostatic, potential-sweep and combined anodization modes with the same final voltage of 30 V. The influences of anodization mode on the crystalline behavior, surface morphology, chemical composition and electrochemical properties of titanium anodized films are studied. The results show that the potentiostatically grown film is thicker, rougher and more crystalline… Show more

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Cited by 32 publications
(38 citation statements)
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“…The capacitance (C) and thickness of the porous layer and barrier layer of the formed anodic titanium oxide films can be calculated by using the methods presented in previous works, 8,45 and the results are shown in Table V. It is found that the porous layer capacitance (C pr ) is lower for the anodic film formed by potentiostatic mode.…”
Section: Methodsmentioning
confidence: 88%
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“…The capacitance (C) and thickness of the porous layer and barrier layer of the formed anodic titanium oxide films can be calculated by using the methods presented in previous works, 8,45 and the results are shown in Table V. It is found that the porous layer capacitance (C pr ) is lower for the anodic film formed by potentiostatic mode.…”
Section: Methodsmentioning
confidence: 88%
“…The current evolution of films growth on sputter-deposited samples is similar to that of high purity titanium anodization. 8 Under potentiostatic condition, the current density is very large at the very beginning stage of anodizing process. As a result, a layer of titanium oxide quickly forms in milliseconds, and meanwhile TiO 2 nanocrystals with various sizes randomly emerge.…”
Section: Discussionmentioning
confidence: 99%
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