1998
DOI: 10.1002/(sici)1521-4079(1998)33:5<733::aid-crat733>3.0.co;2-x
|View full text |Cite
|
Sign up to set email alerts
|

Growth and Dislocation Etching of InBi0.8Sb0.2 Single Crystal

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2010
2010
2015
2015

Publication Types

Select...
2
1

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(1 citation statement)
references
References 9 publications
0
1
0
Order By: Relevance
“…Shepelevich [66] reported work on quenched foils and electrical data in the range 77-300 K. Several authors [67][68][69] report growth of small crystals using the 'rotary' Bridgman technique (accelerated crucible rotation or ACRT) to improve interface solute clearing for InBi contents up to ∼ 7 %. At the other end of the compositional range, for InBi of ∼ 80 %, coarse polycrystals were grown by zone leveling [70].…”
Section: In(bisb)mentioning
confidence: 99%
“…Shepelevich [66] reported work on quenched foils and electrical data in the range 77-300 K. Several authors [67][68][69] report growth of small crystals using the 'rotary' Bridgman technique (accelerated crucible rotation or ACRT) to improve interface solute clearing for InBi contents up to ∼ 7 %. At the other end of the compositional range, for InBi of ∼ 80 %, coarse polycrystals were grown by zone leveling [70].…”
Section: In(bisb)mentioning
confidence: 99%