1996
DOI: 10.1007/bf00133116
|View full text |Cite
|
Sign up to set email alerts
|

Growth of CuInSe2 by metallorganic chemical vapour deposition (MOCVD): new copper precursor

Abstract: Metallorganic chemical vapour deposition (MOCVD) of Cu-ln-Se ternary compounds is performed in a horizontal reactor at atmospheric pressure. A copper precursor has been specially developed for this purpose and is used around room temperature. It is hexafluoroacetylacetonato copper mixed with trimethylamine (Cu(hfa)z, NMe3). The other source materials are triethylindium (TEIn), trimethylindium (TMIn) and hydrogen selenide (HzSe). Experimental parameters are detailed and related to the film composition. Properti… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

1998
1998
2010
2010

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 7 publications
(1 citation statement)
references
References 16 publications
0
1
0
Order By: Relevance
“…A plasma-enhanced CVD has also been reported for fabricating stoichiometric CIS film [168]. CIS thin film has also been deposited by atmospheric pressure metal organic chemical vapor deposition (AP-MOCVD) [169,170]. Brien et al [171][172][173] have deposited CuInSe 2 , CuInS 2 and CuGaSe 2 thin film by low pressure MOCVD.…”
Section: Alternative Cis or Cigs Growth Processmentioning
confidence: 99%
“…A plasma-enhanced CVD has also been reported for fabricating stoichiometric CIS film [168]. CIS thin film has also been deposited by atmospheric pressure metal organic chemical vapor deposition (AP-MOCVD) [169,170]. Brien et al [171][172][173] have deposited CuInSe 2 , CuInS 2 and CuGaSe 2 thin film by low pressure MOCVD.…”
Section: Alternative Cis or Cigs Growth Processmentioning
confidence: 99%