2001
DOI: 10.1557/proc-693-i3.30.1
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Growth of Gallium Nitride Textured Films and Nanowires on Polycrystalline Substrates at sub-Atmospheric Pressures

Abstract: Textured gallium nitride (GaN) films were grown on polished, polycrystalline and amorphous substrates in sub-atmospheric pressures, by direct nitradation of a thin molten gallium films using electron cyclotron resonance (ECR) microwave nitrogen plasma. C-plane texturing was achieved, independent of the substrate crystallinity. Single crystal quality GaN nanowires with diameters ranging from 40-50 nm were also synthesized using direct nitridation of thin gallium films with nitrogen plasma. Scanning electron mic… Show more

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Cited by 16 publications
(29 citation statements)
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“…The experiments using nitrogen and oxygen were performed at relatively high temperatures of 1000 o C. See the SEM in Figure 3(a) for a high density of the resulting GaN nanowires. 20 The GaN experiments were performed in both ECR plasma and hot filament reactor setups and yielded similar results. …”
Section: Gallium Oxide and Gallium Nitride Nanowiresmentioning
confidence: 91%
“…The experiments using nitrogen and oxygen were performed at relatively high temperatures of 1000 o C. See the SEM in Figure 3(a) for a high density of the resulting GaN nanowires. 20 The GaN experiments were performed in both ECR plasma and hot filament reactor setups and yielded similar results. …”
Section: Gallium Oxide and Gallium Nitride Nanowiresmentioning
confidence: 91%
“…The spontaneous nucleation and basal growth of 1-D crystals from low-melting metal melts also applies directly to GaN precipitation from Ga melts, as the solubility of nitrogen in Ga is quite small [11]. In fact, the direct reactions of Ga with nitrogen plasma [12] and dissociated ammonia [13] have already been shown to result in GaN nanowires. The growth directions of the resulting nanowires from these studies were different, i.e., GaN nanowires grew in <10-10> direction with nitrogen plasma at higher temperatures [12] and in <11-20> direction by reacting Ga directly with ammonia [13].…”
Section: Introductionmentioning
confidence: 99%
“…In fact, the direct reactions of Ga with nitrogen plasma [12] and dissociated ammonia [13] have already been shown to result in GaN nanowires. The growth directions of the resulting nanowires from these studies were different, i.e., GaN nanowires grew in <10-10> direction with nitrogen plasma at higher temperatures [12] and in <11-20> direction by reacting Ga directly with ammonia [13]. Both directions are perpendicular to the non-polar surfaces of wurtzitic GaN and the synthesis of GaN wires with <0001> direction, i.e., normal to the polar surface is still elusive.…”
Section: Introductionmentioning
confidence: 99%
“…al on self-oriented growth of GaN films. [14][15][16] In this process, upon exposure of metallic Ga to plasma-activated nitrogen atoms, GaN platelets nucleate and coalesce on the surface of the molten Ga. During the process, these platelets self-orient and form an epitaxial layer. In a following step, hydride vapor phase epitaxy (HVPE), which is characterized by high growth rate and excellent crystal quality, is used for epitaxial thickening of these layers to obtain millimeter thick GaN wafers.…”
Section: Ganmentioning
confidence: 99%
“…141 when grown directly out of Ga films supported on amorphous substrates in the presence of N2 plasma at sub-atmospheric pressures. [14][15][16] The proposed concept, Figure 2.8a, states that different platelets tend to move toward each other and form chemically bonded junctions at the edges where the growth is faster. The movement of the platelets, produced by the force of these bonds, causes the platelets to align themselves with respect to each other, which facilitates in their conjoining, see Figure 2.8b.…”
Section: Nitride Fluxmentioning
confidence: 99%