2012
DOI: 10.1116/1.3680603
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Growth of GaNxAsyP1−x−y alloys on GaP(100) by gas-source molecular beam epitaxy

Abstract: Growth of InP on GaAs (001) by hydrogen-assisted low-temperature solid-source molecular beam epitaxy Solid-source molecular-beam epitaxy growth of GaInNAsSb/InGaAs single quantum well on InP with photoluminescence peak wavelength at 2.04 μ m

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Cited by 15 publications
(5 citation statements)
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“…27 The third peak at around 0.93 eV may be caused by N related defects, which is often seen in dilute nitride materials. 22,28 The N composition is estimated to be $0.8% using the band anti-crossing (BAC) model and PLE spectra detected from GaAs/GaNAs core-shell NWs in Fig. 2(c).…”
mentioning
confidence: 99%
“…27 The third peak at around 0.93 eV may be caused by N related defects, which is often seen in dilute nitride materials. 22,28 The N composition is estimated to be $0.8% using the band anti-crossing (BAC) model and PLE spectra detected from GaAs/GaNAs core-shell NWs in Fig. 2(c).…”
mentioning
confidence: 99%
“…29 This can be significantly suppressed by post-growth rapid thermal annealing (RTA). [30][31][32] In our work, all GaNP samples were treated by RTA at 750 C for 30 s in 95% N 2 and 5% H 2 forming gas ambient. This RTA condition was experimentally determined as the optimal condition providing the highest photoluminescence intensity-a higher intensity indicating lower non-radiative defects.…”
mentioning
confidence: 99%
“…19 The P incorporation rate was calibrated by P-induced RHEED oscillations on a surface with excess Ga adatoms. 19 The substrate was then annealed for 30 s to form Ga seed droplets.…”
mentioning
confidence: 99%
“…19 The P incorporation rate was calibrated by P-induced RHEED oscillations on a surface with excess Ga adatoms. 19 The substrate was then annealed for 30 s to form Ga seed droplets. Growth started by opening the Ga shutter and injecting PH 3 through a hydride injector into the growth chamber to initiate growth of GaP nanowires.…”
mentioning
confidence: 99%