“…If high quality Si 0.5 Ge 0.5 substrates are obtained, high speed and low energy consumption CMOS will be realized. We grew compositionally uniform In 1 À x Ga x As crystals by the traveling liquidus-zone (TLZ) method [2][3][4][5]. Then, we applied the TLZ method to the growth of Si 0.5 Ge 0.5 crystals.…”