Abstract:Lithiated thin films are necessary for the fabrication of novel solid-state batteries, including the electrodes and solid electrolytes. Physical vapour deposition and chemical vapour deposition can be used to deposit lithiated films. However, the issue of conformality on non-planar substrates with large surface area makes them impractical for nanobatteries the capacity of which scales with surface area. Atomic layer deposition (ALD) avoids these issues and is able to deposit conformal films on 3D substrates. H… Show more
“…We have also observed that many sALD reactions can be run even at room temperature, perhaps aided by the presence of the solvent. After demonstrating the sALD generation of oxides 32 and a cubic sulfide, 33 we have started expanding sALD beyond the confines of gALD materials families with a hydride 34 and a polymeric solid. 35 This study demonstrates the applicability of sALD to yet another interesting family of materials, namely transition metal dichalcogenides (TMDCs).…”
The two-dimensional material and semiconducting dichalcogenide hafnium disulfide is deposited at room temperature by atomic layer deposition from molecular precursors dissolved in hexane.
“…We have also observed that many sALD reactions can be run even at room temperature, perhaps aided by the presence of the solvent. After demonstrating the sALD generation of oxides 32 and a cubic sulfide, 33 we have started expanding sALD beyond the confines of gALD materials families with a hydride 34 and a polymeric solid. 35 This study demonstrates the applicability of sALD to yet another interesting family of materials, namely transition metal dichalcogenides (TMDCs).…”
The two-dimensional material and semiconducting dichalcogenide hafnium disulfide is deposited at room temperature by atomic layer deposition from molecular precursors dissolved in hexane.
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