“…The most popular method is the CVD using gaseous sources such as silane (SiH 4 ), [73] [68] ) disilane (R 2 SiH 2 ), [74] and silicon tetrachloride (SiCl 4 ), [75] and plasma-enhanced CVD techniques. [76] In addition, evaporation of pure silicon sources by PLD, [9] by MBE [77] or by thermal evaporation [78] have also been widely practiced. The successfully proved metallic catalysts that promote VLS growth of SiNWs include Ni, Cu, Pd, Ag, Pt, Al, Ga, In, Zn, and Fe.…”