2015
DOI: 10.3131/jvsj2.58.261
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Growth of Target Race Track Profile during Magnetron Sputtering

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Cited by 7 publications
(1 citation statement)
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“…Although some research has been done on the analysis of sputtered thin films, the alteration of the target microstructure as a result of the sputtering process has been severely overlooked. It is well known that the destructive plasma–microstructure interactions occurring on the surface of the target can lead to a ‘racetrack’ phenomenon which is clearly visible to the naked eye (Nakano et al ., 2015; Wu et al ., 2019). Furthermore, experimental studies have shown that during plasma‐enhanced chemical vapour deposition, the resulting product morphology is greatly influenced by the plasma parameters (e.g.…”
Section: Introductionmentioning
confidence: 99%
“…Although some research has been done on the analysis of sputtered thin films, the alteration of the target microstructure as a result of the sputtering process has been severely overlooked. It is well known that the destructive plasma–microstructure interactions occurring on the surface of the target can lead to a ‘racetrack’ phenomenon which is clearly visible to the naked eye (Nakano et al ., 2015; Wu et al ., 2019). Furthermore, experimental studies have shown that during plasma‐enhanced chemical vapour deposition, the resulting product morphology is greatly influenced by the plasma parameters (e.g.…”
Section: Introductionmentioning
confidence: 99%