2002
DOI: 10.1016/s0039-6028(01)01846-5
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Growth of ultrathin epitaxial FexCo1−x alloy films on Si(001): stabilization of metastable bcc Co

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Cited by 8 publications
(3 citation statements)
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“…The idea is to organize the interface phase in order to form a well-defined compound instead of letting the system intermixing naturally. Bertoncini et al [18,19] have used a thin disilicide MSi 2 layer (M = Co, Fe) prior to Fe deposition. This thin disilicide layer, prepared by deposition of some ML of Fe on Si at room temperature followed by annealing at ∼550°C, can act as a diffusion barrier of silicon substrate atom into the Fe overlayer.…”
Section: Resultsmentioning
confidence: 99%
“…The idea is to organize the interface phase in order to form a well-defined compound instead of letting the system intermixing naturally. Bertoncini et al [18,19] have used a thin disilicide MSi 2 layer (M = Co, Fe) prior to Fe deposition. This thin disilicide layer, prepared by deposition of some ML of Fe on Si at room temperature followed by annealing at ∼550°C, can act as a diffusion barrier of silicon substrate atom into the Fe overlayer.…”
Section: Resultsmentioning
confidence: 99%
“…The idea consists of organizing the interface phase in order to form a well-defined compound instead of letting the system intermixing naturally. Bertoncini et al [15,16] have used a thin disilicide MSi 2 layer (M = Co, Fe) prior to Fe deposition. This thin disilicide layer, prepared by deposition of some MLs of Fe on Si at room temperature followed by annealing at $550 8C, can act as a diffusion barrier of silicon substrate atoms into the Fe overlayer.…”
Section: Introductionmentioning
confidence: 99%
“…Later, bcc Co was stabilized in between Fe layers and Cr layers, 11 in between Au layers, 12 and on some alloy substrates such as TiAl 13 and CoSi 2 /Si(001). 14 In the following section, we will give a short overview of the reports on bcc Co in the literature.…”
Section: Introductionmentioning
confidence: 99%