Growth of ZnS films by chemical vapor deposition of Zn[S2CN(CH3)2]2 precursor

Preparation and characterisation of thickness dependent nano-structured ZnS thin films by sol–gel technique

“…It is observed that the film produced at 748 K is mainly amorphous, but increasing the annealing temperature from 773 to 823 K results in crystallic development with the maximum peak intensity obtained at 823 K. The XRD patterns show that the films have mixture of hexagonal (a) and cubic phases (b) with a predominance of the cubic phase (b). In many studies [19][20][21][22], depending on the preparation technique and synthesis conditions such as the temperature and precursor concentrations, zinc sulfide has both the cubic and/or hexagonal structures. For example, Afifi et al [8] reported a cubic phase for ZnS thin films prepared by spray pyrolysis technique at 823 K, which is in agreement with our result at 823 K. Hichou et al [22] reported a polycrystalline ZnS thin film with combination of cubic and hexagonal phases at 773 K using the spray pyrolysis technique, consistent with the results of our study.…”

Non-toxic complexing agent Tri-sodium citrate’s effect on chemical bath deposited ZnS thin films and its growth mechanism

“…ZnS films can be deposited by several physical methods such as pulsed-laser deposition [21], RF reactive magnetron sputtering [22], chemical vapor deposition [23], atomic layer deposition [24], as well as some chemical methods including spray pyrolysis [25], sol-gel [26], and electrodeposition [27]. Although the physical techniques result in better quality thin films, these methods require a vacuum, high quality targets, and high energy; all of which make for a significant hurdle, economically.…”

Evaporation of uniform antireflection coatings on hemispherical lenses to enhance infrared antenna gain

“…To account for this, a constant thickness offset must be added to Eq. (9). This is further justified by the fact that zinc sulfide has a relatively high vapor pressure of $10 À5 torr, and may outgas during chamber evacuation.…”

“…Therefore, a thickness offset of 0.3E 0 is added to Eq. (9) prior to normalization. This has the effect of flattening the distribution over the lens surface.…”

“…For example, the CVD process for zinc sulfide typically involves separate sources of zinc and sulfur, which can react prematurely to produce highly toxic precursors, including Zn(C 2 H 5 ) 2 and H 2 S [9]. In addition, the high temperatures involved in a LPCVD process may be incompatible with materials having a low melting point, such as aluminum.…”