2014
DOI: 10.1007/s11664-013-2962-8
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Growth of ZnSnN2 by Molecular Beam Epitaxy

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Cited by 29 publications
(37 citation statements)
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“…Carrier densities were typically greater than 10 20 cm -3 , likely due to poor nitrogen incorporation or the presence of oxygen impurities that are difficult to avoid in nitride materials. [4][5][6]16 However, with the publication of Ref. [17] and the results of the present study, it is now known that carrier densities on the order of 10 17 -10 18 cm -3 are attainable, which approaches a relevant range for PV applications.…”
Section: Introductionmentioning
confidence: 93%
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“…Carrier densities were typically greater than 10 20 cm -3 , likely due to poor nitrogen incorporation or the presence of oxygen impurities that are difficult to avoid in nitride materials. [4][5][6]16 However, with the publication of Ref. [17] and the results of the present study, it is now known that carrier densities on the order of 10 17 -10 18 cm -3 are attainable, which approaches a relevant range for PV applications.…”
Section: Introductionmentioning
confidence: 93%
“…This finding is also consistent with previous works achieving c-axis oriented ZnSnN 2 thin films on (111) yttria-stabilized zirconia, GaN, or c-plane sapphire substrates. 5,6,16 …”
Section: Crystal Structurementioning
confidence: 99%
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“…17 and molecular-beam epitaxy. 18,19 Reactive radio-frequency (RF) sputtering produces films that are more uniform than films fabricated using other methods. In addition, to date, all methods have reported ZnSnN 2 samples that exhibit majority carrier concentrations at or above degenerate doping levels.…”
mentioning
confidence: 99%
“…In addition, to date, all methods have reported ZnSnN 2 samples that exhibit majority carrier concentrations at or above degenerate doping levels. 18,19 The preparation of sputtered ZnSn x Ge 1−x N 2 alloy films with compositions such that 0.025 < x < 1 and the structural and optoelectronic properties of such films have been described previously. 9 Herein, we describe the preparation of samples with low-Sn content (less than 10% atomic concentration Sn, x = 0.025) and report on the structural and optoelectronic properties of these members of the ZnSn x Ge 1−x N 2 alloy series.…”
mentioning
confidence: 99%