“…[ 24 ] Similarly, this higher sputtering rate can also account for the significant difference in the observed CSL fractions between the top surface and cross section for sample C: due to mobility as stated earlier, [ 24 ] or through increased stress relaxation from the interrupted sputtering process, which is more energetically favorable for the formation of special boundaries. [ 15 ] As the film grew, the high deposition rate increased the temperature at the free surface where new growth was occurring, [ 23 ] promoting even greater boundary mobility and diffusion [ 24,25 ] and activating more boundary annihilation toward the top of the sample, yielding fewer CSL boundaries. [ 26 ] Furthermore, it is also possible that the Σ3 and Σ7 boundaries possessed similar energies when they appeared together, as has been previously observed by Tschopp et al, [ 27,28 ] as the GB plane orientation can produce large variations in GB energy even for boundaries with the same Σ value.…”