Half-sandwich cobalt complexes in the metal-organic chemical vapor deposition process

Georgi, Colin; Hapke, Marko; Thiel, Indre; Hildebrandt, Alexander; Waechtler, Thomas; Schulz, Stefan E.; Lang, Heinrich

doi:10.1016/j.tsf.2015.01.052

Cited by 8 publications

(8 citation statements)

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“…A lower heating rate leads to the evaporation of the preferred compounds, which is beneficial for the vapor pressure measurements (see below). 32,33 The TG traces also indicate that marginal changes in the periphery of the complex, for example, the modification of the carboxylate ligands, do not have a significant effect on the evaporation and decomposition process. This observation is also confirmed by the similarity of the respective onset temperatures ranging from 244 1C for 4b to 277 1C for 4f (Table 1).…”

Section: Thermal Behavior and Vapor Pressure Measurementsmentioning

confidence: 99%

Chemical vapor deposition of ruthenium-based layers by a single-source approach

et al. 2016

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A series of ruthenium complexes of the general type Ru(CO)2(P(n-Bu)3)2(O2CR)2 (4a, R = Me; 4b, R = Et; 4c, R = i-Pr; 4d, R = t-Bu; 4e, R = CH2OCH3; 4f, R = CF3; 4g, R = CF2CF3) was synthesized by a single-step reaction of Ru3(CO)12 with P(n-Bu)3 and the respective carboxylic acid. The molecular structures of 4b, 4c and 4e–g in the solid state are discussed. All ruthenium complexes are stable against air and moisture and possess low melting points. The physical properties including the vapor pressure can be adjusted by modification of the carboxylate ligands. The chemical vapor deposition of ruthenium precursors 4a–f was carried out in a vertical cold-wall CVD reactor at substrate temperatures between 350 and 400 °C in a nitrogen atmosphere. These experiments show that all precursors are well suited for the deposition of phosphorus-doped ruthenium layers without addition of any reactive gas or an additional phosphorus source. In the films, phosphorus contents between 11 and 16 mol% were determined by XPS analysis. The obtained layers possess thicknesses between 25 and 65 nm and are highly conformal and dense as proven by SEM and AFM studies

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Section: Thermal Behavior and Vapor Pressure Measurementsmentioning

confidence: 99%

Chemical vapor deposition of ruthenium-based layers by a single-source approach

et al. 2016

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“…These commercial usages have spawned tremendous interest not only in optimizing and understanding Co film growth processes and resulting properties, but also in expanding their use in future IC products. Other uses of metallic cobalt and cobalt containing films (such as oxides, sulfides, silicides and nitrides) include magneto-optic recording media, 14 data storage, 15,16 sensor technologies, 15,[17][18][19] catalysts for growing carbon nanotubes and self-aligned nanowires, 15,18,19 reflective thin films for optical devices 17 and, more broadly, as antibacterial, 18,19 decorative, protective 17 and wear-resistant coatings. 20 Given cobalt's increasing potential to continue enabling exciting innovations across numerous industrial sectors, this article presents an overview of recent advancements in Co vapor phase processing techniques and their impact on film physical, chemical and electrical properties.…”

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confidence: 99%

Editors' Choice—Review—Cobalt Thin Films: Trends in Processing Technologies and Emerging Applications

Kaloyeros

Pan

Goff

et al. 2019

ECS J. Solid State Sci. Technol.

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Cobalt metallic films are the subject of an ever-expanding academic and industrial interest for incorporation into a multitude of new technological applications. This report reviews the state-of-the art chemistry and deposition techniques for cobalt thin films, highlighting innovations in cobalt metal-organic chemical vapor deposition (MOCVD), plasma and thermal atomic layer deposition (ALD), as well as pulsed MOCVD technologies, and focusing on cobalt source precursors, thin and ultrathin film growth processes, and the resulting effects on film composition, resistivity and other pertinent properties.) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 50.235.43.225 Downloaded on 2019-02-27 to IP P120 ECS Journal of Solid State Science and Technology, 8 (2) P119-P152 (2019) ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 50.235.43.225 Downloaded on 2019-02-27 to IP ECS Journal of Solid State Science and Technology, 8 (2) P119-P152 (2019) P121 ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 50.235.43.225 Downloaded on 2019-02-27 to IP 7 Elliott et al. (2017) ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 50.235.43.225 Downloaded on 2019-02-27 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 50.235.43.225 Downloaded on 2019-02-27 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 50.235.43.225 Downloaded on 2019-02-27 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 50.235.43.225 Downloaded on 2019-02-27 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 50.235.43.225 Downloaded on 2019-02-27 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 50.235.43.225 Downloaded on 2019-02-27 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 50.235.43.225 Downloaded on 2019-02-27 to IP

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“…It was observed that Co films used in sensor application, data storage, CNT (carbon nano-tube), reflective films, for optical devices and also used for coating purpose such as antibacterial coating, decorative coating, protective coating and also for coating in optical devices [10][11][12][13][14][15] both energy production and energy storage have equal importance and cobalt oxide proves a very promising candidate for sensor such as gas sensor and magnetic sensor. Cobalt oxide is anodic colored material which is subpart of electro-chromic materials [16].…”

Section: Introductionmentioning

confidence: 99%

Review of Cobalt Oxide (CoO) thin films prepared by various techniques

Himanshu

Kumar

2022

J. Phys.: Conf. Ser.

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It is reviewed that for fulfilling the demands of portable devices like phones, watches, low-cost energy storage system etc, cobalt oxides and their composite play a very promising role. Recently, nanotechnology has great application toward gay to-day life. This paper reviews the various deposition techniques for cobalt thin films such as chemical spray pyrolysis, atomic layer deposition, metal organic chemical vapor deposition, plasma atomic layer deposition, facile spray pyrolysis technique, spin coating techniques and reactive pulsed magnetron sputtering. Cobalt oxides are semiconductors and this material is very useful in electronic, optical and catalytic applications. In this review paper, various methods for formation of thin films were discussed. Number of properties such as structural, electrochemical and morphological of these prepared films was studied. It was observed that annealing temperature has great intense effect on thickness of films. This paper also discussed the characterization technique carried by researcher such as UV-spectroscopy, Fourier transform infrared spectroscopy, scanning electron microscopy, transmission electron microscopy, atomic force microscopy and high-resolution scanning electron microscopy (HRSEM). It was concluded that cobalt metallic films have great contribution toward new technological applications.

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Half-sandwich cobalt complexes in the metal-organic chemical vapor deposition process

Cited by 8 publications

References 47 publications

Chemical vapor deposition of ruthenium-based layers by a single-source approach

Chemical vapor deposition of ruthenium-based layers by a single-source approach

Editors' Choice—Review—Cobalt Thin Films: Trends in Processing Technologies and Emerging Applications

Review of Cobalt Oxide (CoO) thin films prepared by various techniques

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