1991
DOI: 10.1007/bf02654537
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Hall effect analysis of high purity p-type GaAs grown by metalorganic chemical vapor deposition

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Cited by 17 publications
(1 citation statement)
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“…Moreover, Ma et al [126] obtained a hole mobility of 459 cm 2 V −1 s −1 at room temperature within the BTE, which is about 30% larger than the SERTA result. Their results are in good agreement with experimental values, ranging from 188 cm 2 V −1 s −1 to 460 cm 2 V −1 s −1 [182,192,194,[196][197][198]. As in the case of silicon, the hole mobility was found to be strongly affected by SOC: neglecting SOC underestimates the calculated (BTE) hole mobility of GaAs by as much as 50%.…”
Section: Gallium Arsenidesupporting
confidence: 83%
“…Moreover, Ma et al [126] obtained a hole mobility of 459 cm 2 V −1 s −1 at room temperature within the BTE, which is about 30% larger than the SERTA result. Their results are in good agreement with experimental values, ranging from 188 cm 2 V −1 s −1 to 460 cm 2 V −1 s −1 [182,192,194,[196][197][198]. As in the case of silicon, the hole mobility was found to be strongly affected by SOC: neglecting SOC underestimates the calculated (BTE) hole mobility of GaAs by as much as 50%.…”
Section: Gallium Arsenidesupporting
confidence: 83%