Halogen plasma erosion resistance of rare earth oxide films deposited on plasma sprayed alumina coating by aerosol deposition

Jung, Jae‐Hyun; Hahn, Byung‐Dong; Yoon, Woon‐Ha; Park, Dong-Soo; Choi, Jong‐Jin; Ryu, Jungho; Kim, Jong-Woo; Ahn, Cheol‐Woo; Song, Kie Moon

doi:10.1016/j.jeurceramsoc.2012.02.019

Cited by 15 publications

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“…5 As an alternative, various coating technologies were developed to deposit functional Y 2 O 3 coatings on quartz glass or Al 2 O 3 substrates to increase their erosion resistance. 6,7 Especially aerosol deposition 1,8 and thermal spray techniques [8][9][10] are established in the industry for applying Y 2 O 3 or other rare earth oxide coatings.…”

Section: Introductionmentioning

confidence: 99%

Processing map to control the erosion of Y₂O₃ in fluorine based etching plasmas

et al. 2022

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Due to the increasing number of applications for ceramic components in reactive etching processes, the interest in the specific erosion behavior of highly etchresistant materials like yttrium oxide (Y 2 O 3 ) has increased in the past years.Despite the large number of investigations already existing in this field, a more general understanding of the erosion mechanisms still lacks due to the limited comparability of these investigations. The huge difference in the kind of etching setups, processing parameters (bias voltage and plasma gas composition), and sample microstructures prevented consistent conclusions so far. To achieve a more general understanding, this study investigates the erosion behavior Y 2 O 3 under a broad spectrum of plasma etching parameters. Therefore, the bias voltage is increased from 50 to 300 V and the plasma gas composition is gradually changed from Ar-rich to CF 4 -rich compositions. This systematic approach allows to directly correlate the morphology changes caused by plasma erosion with the related plasma etching parameters and enables to better understand their influence on the depth of physical and chemical interactions, surface damage, and etching rate. We discovered three distinct erosion regimes, which exhibit specific erosion characteristics. Using these observations, a schematic processing map for Y 2 O 3 was developed, which could help to estimate the severity of the erosion attack dependent on the processing parameters.

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Section: Introductionmentioning

confidence: 99%

Processing map to control the erosion of Y₂O₃ in fluorine based etching plasmas

et al. 2022

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“…Different coating techniques are used to apply yttria: Iwasawa et al introduced aerosol deposition (AD) as a novel coating technology for yttria on quartz substrates 3 . Jung et al and Ashizawa et al applied AD to other rare earth compounds and investigated their erosion behavior 7,8 . Furthermore, thermal spray techniques like atmospheric plasma spray 9,10 and suspension plasma spray 11,12 were used for yttria coatings aiming to increase the durability of etching equipment.…”

Section: Introductionmentioning

confidence: 99%

Erosion behavior of Y₂O₃ in fluorine‐based etching plasmas: Orientation dependency and reaction layer formation

et al. 2020

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Accepted Article This article is protected by copyright. All rights reserved Even though advanced ceramics are widely applied as consumables in semiconductor etching processes, the erosion mechanisms and connected surface phenomena are not fully understood. Through the interaction with reactive species and ion bombardment during the plasma exposure, oxide ceramic materials like Y 2 O 3 are eroded by a physico-chemical mechanism. In this paper, fundamental phenomena of surface-plasma interactions were investigated directly at the surface as well as in the near-surface region after exposure to fluorine-based etching plasmas. A straightforward re-localization technique was used to investigate the microstructural features before and after the plasma exposure for up to 2 h. Electron microscopy methods (SEM, EBSD) were coupled with atomic force microscopy (AFM), secondary ion mass spectroscopy (SIMS), and transmission electron microscopy (TEM) to study the surface topography and the corresponding reaction layer. Direct correlation of the microstructure before plasma exposure with the surface topography reveals a novel orientation-dependent erosion mechanism that forms plateau-like structures. Furthermore, the indepth analysis of the near-surface area highlights the influence of the applied bias voltage on the physical damage and chemical gradient formation due to plasma exposure. The combined investigation of surface morphology and near-surface properties reveals new fundamental aspects of the erosion behavior of polycrystalline yttria in CF 4-based etching plasmas.

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What Happens during Thermal Post‐Treatment of Powder Aerosol Deposited Functional Ceramic Films? Explanations Based on an Experiment‐Enhanced Literature Survey

et al. 2020

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Powder aerosol deposition (PAD) is a unique ceramic spray coating method that produces dense and well‐adhering thick‐films directly at room temperature, without requiring any heating or sintering. After the successful film formation, mechanical film properties like hardness or plasma resistance are remarkably good. However, when it comes to electrical properties like permittivity or electrical conductivity, the nanocrystalline structure of PAD films combined with high internal strains deteriorates partly the characteristic properties. The electrical conductivity may already be present within the as‐deposited films. However, it is mostly lowered by several orders of magnitude. Therefore, a thermal post‐deposition annealing is oftentimes required. In this work, electrically conducting films produced by powder aerosol deposition are surveyed based on published data. Their microstructural and electrical behavior during the post‐deposition annealing treatment is summarized and reasons for the lowered electrical conductivity are identified. Additionally, the processes taking place during annealing, which eventually allow to regain bulk‐like functional properties, are examined. A universal annealing behavior is found that leads to a quantitative recommendation for the suitable film annealing temperatures to regain the electrical conductivities.

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Halogen plasma erosion resistance of rare earth oxide films deposited on plasma sprayed alumina coating by aerosol deposition

Cited by 15 publications

References 15 publications

Processing map to control the erosion of Y₂O₃ in fluorine based etching plasmas

Processing map to control the erosion of Y₂O₃ in fluorine based etching plasmas

Erosion behavior of Y₂O₃ in fluorine‐based etching plasmas: Orientation dependency and reaction layer formation

What Happens during Thermal Post‐Treatment of Powder Aerosol Deposited Functional Ceramic Films? Explanations Based on an Experiment‐Enhanced Literature Survey

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Halogen plasma erosion resistance of rare earth oxide films deposited on plasma sprayed alumina coating by aerosol deposition

Cited by 15 publications

References 15 publications

Processing map to control the erosion of Y2O3 in fluorine based etching plasmas

Processing map to control the erosion of Y2O3 in fluorine based etching plasmas

Erosion behavior of Y2O3 in fluorine‐based etching plasmas: Orientation dependency and reaction layer formation

What Happens during Thermal Post‐Treatment of Powder Aerosol Deposited Functional Ceramic Films? Explanations Based on an Experiment‐Enhanced Literature Survey

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Product

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Processing map to control the erosion of Y₂O₃ in fluorine based etching plasmas

Processing map to control the erosion of Y₂O₃ in fluorine based etching plasmas

Erosion behavior of Y₂O₃ in fluorine‐based etching plasmas: Orientation dependency and reaction layer formation