“…These systems benefit from an even stronger Rashba type of SOI that relies on the HH-LH mixing and is not suppressed by the fundamental band gap [32,33]. In agreement with recent experiments [15,17,[34][35][36][37][38][39][40][41], Si and Ge/Si core/shell nanowires (NWs) are particularly promising platforms for such low-dimensional hole systems. Remarkably, these NWs and QDs therein can be formed with a complementary metal-oxide-semiconductor compatible fabrication process [17,36,38,42,43], which indicates an exceptional scalability.…”