1992
DOI: 10.1116/1.585970
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Helium field ion source for application in a 100 keV focused ion beam system

Abstract: A He gas-phase ion source having a three-electrode acceleration lens that can change the acceleration energy and magnification independently was developed. This source allows application of acceleration voltages up to 100 kV and extraction voltages up to 30 kV. This source is a component of our final objective of development, a nanometer lithography system with a beam diameter of 10 nm and a beam energy of 100 keV. In the present experiment, by using this source, the characteristics of He ion current emitted f… Show more

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“…[d] (Sakata et al, 1992): Current was measured through microchannel plate using predetermined calibration. Determination of solid angle was not discussed.…”
Section: Methodsmentioning
confidence: 99%
“…[d] (Sakata et al, 1992): Current was measured through microchannel plate using predetermined calibration. Determination of solid angle was not discussed.…”
Section: Methodsmentioning
confidence: 99%