Helium focused ion beam fabricated plasmonic antennas with sub-5 nm gaps

Scholder, Olivier; Jefimovs, Konstantins; Shorubalko, Ivan; Hafner, Christian; Sennhauser, U.; Bona, G.L.

doi:10.1088/0957-4484/24/39/395301

Cited by 73 publications

(49 citation statements)

References 23 publications

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“…This has been demonstrated, e.g., for graphene, 10-12 silicon nitride, 13 and recently gold nanorods. 14 Here, we employed helium ion beam lithography to pattern nanogaps into metallic carbon nanotubes, in a device geometry. These nanogaps were then used as contacts for a molecular wire, to demonstrate their practical usage.…”

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confidence: 99%

Fabrication of carbon nanotube nanogap electrodes by helium ion sputtering for molecular contacts

et al. 2014

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confidence: 99%

Fabrication of carbon nanotube nanogap electrodes by helium ion sputtering for molecular contacts

et al. 2014

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“…[20][21][22][23][24] One limitation of using nanoslits for this type of plasmonic enhancement in various applications is the difficulty of reliable fabrication at the sub-10-nm scale, which is below the resolution limit of most lithography systems, and over large wafer-scale areas. 25 Existing gap-fabrication methods, such as focused ion beam (FIB) milling, [26][27][28] electromigration, [29][30][31][32][33] mechanical break junctions, 34 or photo/electron/ ion beam lithographies, [26][27][28]35,36 have the limitation that they must create gaps serially. It is crucial to consider the time of fabrication for a large area of nanostructures or slits when considering scaling up of the technology for applications beyond pure basic research.…”

Section: Introductionmentioning

confidence: 99%

Fabrication and analysis of metallic nanoslit structures: advancements in the nanomasking method

Bauman

Darweesh

Debu

et al. 2018

J. Micro/Nanolith. MEMS MOEMS

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, "Fabrication and analysis of metallic nanoslit structures: advancements in the nanomasking method," J. Micro/Nanolith. MEMS MOEMS 17(1), 013501 (2018), doi: 10.1117/1.JMM.17.1.013501. Abstract. This work advances the fabrication capabilities of a two-step lithography technique known as nanomasking for patterning metallic nanoslit (nanogap) structures with sub-10-nm resolution, below the limit of the lithography tools used during the process. Control over structure and slit geometry is a key component of the reported method, exhibiting the control of lithographic methods while adding the potential for mass-production scale patterning speed during the secondary step of the process. The unique process allows for fabrication of interesting geometric combinations such as dual-width gratings that are otherwise difficult to create with the nanoscale resolution required for applications, such as nanoscale optics (plasmonics) and electronics. The method is advanced by introducing a bimetallic fabrication design concept and by demonstrating blanket nanomasking. Here, the need for the secondary lithography step is eliminated improving the mass-production capabilities of the technique. Analysis of the gap width and edge roughness is reported, with the average slit width measured at 7.4 AE 2.2 nm. It was found that while no long-range correlation exists between the roughness of either gap edge, and there are ranges in the order of tens of nanometers over which the slit edge roughness is correlated or anticorrelated across the gap. This work helps quantify the nanomasking process, which aids in future fabrications and leads toward the development of more accurate computational models for the optical and electrical properties of fabricated devices. © The Authors. Published by SPIE under a Creative Commons Attribution 3.0 UnportedLicense. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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“…plasmonic devices -unlike structures achieved by just metal deposition using top-down methodwere fabricated recently by means of electron-beam lithography (EBL) and focused ion beam (FIB) lithography in combination with reactive ion etching (RIE) in order to have a better enhancement and reproducible SERS device for single molecule detection (SMD) or few molecules detection (FMD) [20][21][22][23] . 3D-nanostructure device fabrication could be employed to improve the detection capability of the sensor.…”

Section: Introductionmentioning

confidence: 99%