2008
DOI: 10.1002/cvde.200706664
|View full text |Cite
|
Sign up to set email alerts
|

Heteroepitaxial YAlO3 Films on (100)SrTiO3 Substrates: The Use of Pole Figures as a Non‐invasive Tool to Assess the Direction of Growth

Abstract: YAlO 3 films are grown on (100)SrTiO 3 substrates through an in-situ novel metal-organic (MO)CVD strategy involving a molten source consisting of the second-generation Y(hfa) 3 ·diglyme (Hhfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedione, diglyme = bis(2-methoxyethyl)ether) precursor which acts as a solvent for the Al(acac) 3 (Hacac = acetylacetone). The X-ray diffraction (XRD) patterns show that the films are crystalline and highly oriented, while compositional analysis indicates that the films possess the correc… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
3
0

Year Published

2010
2010
2023
2023

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 7 publications
(4 citation statements)
references
References 13 publications
1
3
0
Order By: Relevance
“…The full width at half maximum (FWHM) of the XRD peak (004) of the film on the LAO substrate was 0.20°. The FWHM value is comparable to that of strongly oriented YAlO 3 film prepared by MOCVD [23], suggesting a high degree of crystallization in the YAlO 3 film on the LAO substrate. The XRD peak position of the film on the LAO substrate agreed with that of powder sample of YAlO 3 :Gd 3+ -Pr 3+ , implying that the film on the LAO substrate was crystallized without much stress.…”
Section: Methodssupporting
confidence: 74%
“…The full width at half maximum (FWHM) of the XRD peak (004) of the film on the LAO substrate was 0.20°. The FWHM value is comparable to that of strongly oriented YAlO 3 film prepared by MOCVD [23], suggesting a high degree of crystallization in the YAlO 3 film on the LAO substrate. The XRD peak position of the film on the LAO substrate agreed with that of powder sample of YAlO 3 :Gd 3+ -Pr 3+ , implying that the film on the LAO substrate was crystallized without much stress.…”
Section: Methodssupporting
confidence: 74%
“…The authors described these multimetal liquid mixtures as “single sources” because it could be easily and cleanly evaporated with constant mass-transport rates and stoichiometric ratios. Thus, homogeneous and smooth films of LnAlO 3 (Ln = Y, , La, Pr) were deposited on SrTiO 3 (100)/(110) or Si(100) substrates at temperature ranging from 900 to 1050 °C from a molten multicomponent source containing the [Ln­(hfac) 3 (diglyme)] (Ln = Y, La, Pr) and Al­(acac) 3 precursors. Films as thick as 600 nm could be fabricated upon tuning the deposition time.…”
Section: Applications As Precursors In Materials Sciencementioning
confidence: 99%
“…An MOCVD approach has been successfully applied to the fabrication of BaCeO 3 and Y-doped BaCeO 3 thin films on MgO (100), and yttria-stabilized zirconia (YSZ) (100) substrates, starting from the Ba(hfa) 2 tetraglyme, Ce(hfa) 3 diglyme and Y(hfa) 3 diglyme complexes. The suitability as MOCVD precursors of the above-mentioned adducts, previously synthesized in our group [31][32][33], has been assessed through their application to the fabrication of various materials: (i) the Ce(hfa) 3 diglyme has been applied to the growth of binary CeO 2 thin films [34]; (ii) the Ba(hfa) 2 tetraglyme has been used to fabricate the piezoelectric Ba and Ti co-doped BiFeO 3 textured films [35]; and (iii) the Y(hfa) 3 diglyme has been applied for the fabrication of the YAlO 3 films [36].…”
Section: Resultsmentioning
confidence: 99%