2016
DOI: 10.1063/1.4971350
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Heterogeneously integrated III–V-on-silicon 2.3x μm distributed feedback lasers based on a type-II active region

Abstract: We report on 2.3x lm wavelength InP-based type-II distributed feedback (DFB) lasers heterogeneously integrated on a silicon photonics integrated circuit. In the devices, a III-V epitaxial layer stack with a "W"-shaped InGaAs/GaAsSb multi-quantum-well active region is adhesively bonded to the first-order silicon DFB gratings. Single mode laser emission coupled to a single mode silicon waveguide with a side mode suppression ratio of 40 dB is obtained. In continuous-wave regime, the 2.32 lm laser operates close t… Show more

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Cited by 22 publications
(15 citation statements)
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“…The device cross section is similar to that shown in Ref. [16], but thinner DVS-BCB is used in the DFB laser arrays presented in this paper. The smaller gap between the active region and the DFB grating leads to a stronger coupling.…”
mentioning
confidence: 85%
See 1 more Smart Citation
“…The device cross section is similar to that shown in Ref. [16], but thinner DVS-BCB is used in the DFB laser arrays presented in this paper. The smaller gap between the active region and the DFB grating leads to a stronger coupling.…”
mentioning
confidence: 85%
“…However, the emission wavelength range of laser sources based on the InP-based Type I material is limited to around 2.3 μm [15]. Recently, we demonstrated 2.3x μm heterogeneous III-Von-silicon distributed feedback (DFB) laser sources based on an InP-based Type II heterostructure [16]. These lasers have been proven to be suitable for carbon monoxide gas detection using direct absorption spectroscopy, but the tuning range (by changing the driven current) of a single device is limited to 2 nm.…”
mentioning
confidence: 99%
“…For example, pulse mode laser emission up to 4-μm wavelength at room temperature was recently demonstrated utilizing GaSb type-II quantum well structures [74]. Several instances of heterogeneous integration of III-V mid-IR diode lasers and amplifiers with Si waveguides have been reported, including InP-based FabryPerot (F-P) and DFB lasers emitting at 2.0 μm [75] and 2.3 μm [76,77], GaSb-based F-P laser operating at 2.38 μm [78], and InP-based optical amplifier at 2.0 μm [79]. Figure 5 depicts the structure of an InP-based multi-quantum-well (MQW) F-P laser on Si emitting at 2.3 μm [76], which exemplifies a large class of heterogeneously integrated III-V lasers.…”
Section: Siliconmentioning
confidence: 99%
“…However, the heterogeneous integration of GaSb‐based material is much less established than is the case for InP‐based material. Recently, we demonstrated the heterogeneous integration of III‐V/silicon laser sources emitting beyond 2.3 μm, by integrating InP‐based type‐II heterostructures on silicon PICs …”
Section: Heterogeneously Integrated Iii‐v/si Lasersmentioning
confidence: 99%
“…(a) Emission spectrum of the InP/Si type‐II DFB laser; (b) TDLAS spectrum of CO and the corresponding high‐resolution transmission molecular absorption database (HITRAN) spectrum. (Reproduced from)…”
Section: Heterogeneously Integrated Iii‐v/si Lasersmentioning
confidence: 99%