2016
DOI: 10.7567/apex.9.111601
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Heterojunction effect on contact resistance minimization in staggered pentacene thin-film transistors

Abstract: The MoO3/pentacene heterojunction is demonstrated to be effective for reducing the contact resistance in staggered organic thin-film transistors. The heterojunction-induced doping is nondestructive and may form a top conducting channel close to the pentacene surface. Contact interface doping and channel doping both significantly reduced the contact resistance. The effect of channel doping was prominent at low gate bias values, which is ascribed to the negligible access resistance owing to the presence of the t… Show more

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Cited by 5 publications
(2 citation statements)
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“…Nanometer‐ and sub‐nanometer‐scale conducting or semiconducting layers, such as graphene, CNT, and TiSi x , have been used at the contacts of TFTs, for gaining a better Ohmic behavior or tunneling behavior . Likewise, nanometer‐scale insulating layers also have been widely used as the gate insulators for deep sub‐micrometer transistors and memory devices based on floating‐gate principles .…”
Section: Structural and Electrical Characteristics Of Source‐gated Trmentioning
confidence: 99%
“…Nanometer‐ and sub‐nanometer‐scale conducting or semiconducting layers, such as graphene, CNT, and TiSi x , have been used at the contacts of TFTs, for gaining a better Ohmic behavior or tunneling behavior . Likewise, nanometer‐scale insulating layers also have been widely used as the gate insulators for deep sub‐micrometer transistors and memory devices based on floating‐gate principles .…”
Section: Structural and Electrical Characteristics Of Source‐gated Trmentioning
confidence: 99%
“…The standard approach consists of adding a dopant layer solely under the top electrodes for reducing contact resistance. The so-called contact doping increases the carrier concentration at the contact region and aids in reducing the depletion layer, filling interfacial traps, and improving the charge transport across the OSC film (reducing the access resistance) in a staggered bottom gate geometry. The deposition of a thin dopant layer onto the OSC film in the channel has attracted interest as an additional approach to improve the device operation by achieving enhanced mobility and reducing threshold voltage by filling trap states in the channel. , Contact and channel doping, generally referred to as surface doping, relies on integer electron charge transfer between the OSC and the molecular dopant (i.e., ion pair formation).…”
Section: Introductionmentioning
confidence: 99%