2017
DOI: 10.1088/2053-1591/aa9c91
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Heterojunction silicon solar cells performance optimization and sensitivity reduction to the interface defect states

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Cited by 7 publications
(5 citation statements)
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“…Therefore, the optimized value of defect density is set to 10 10 cm −3 . Similar analysis on response of CSC solar cell based on c-Si defect density is performed by Bashiri et al [107].…”
Section: Defect Density Of Crystalline Silicon C-simentioning
confidence: 53%
“…Therefore, the optimized value of defect density is set to 10 10 cm −3 . Similar analysis on response of CSC solar cell based on c-Si defect density is performed by Bashiri et al [107].…”
Section: Defect Density Of Crystalline Silicon C-simentioning
confidence: 53%
“…The NPS material energy gap is definitely having higher energy gaps compared with bulk commercial silicon (1.11 eV) [10]. Table 1 shows 2 groups of samples (4,5,6) and (7,8,9), that display the inverse proportional relation be- The presence of various chemical functional groups and formation of NPS are described by the FTIR spectra in the range 400 -4000 cm −1 .…”
Section: Resultsmentioning
confidence: 98%
“…5e-14 / 5e-15 [12] / [5] 5e-14 / 5e-15 [12] 2e-14 / 2e-15 [12] 1e-18 / 1e-19 [36] Dangling bonds peak energies (eV) 1.1 / 1.3 [12] 0.45 / 0.7 [12] 0.9 / 1.1 [12] 0.46 / 0.66 [36] * dbpeak N values were changed from the reference in order to obtain realistic activation energies (300 meV and 200 meV) for the p-a-Si:H and n-a-Si:H layers, respectively.…”
Section: Dangling Bondsmentioning
confidence: 99%
“…In particular, we analyse the effects of dangling bond defects in doped a-Si:H layers in relation to indium tin oxide (ITO) transparent conductive oxide (TCO) contacts with different electron affinities χ. Various numerical models emerged from the research of SHJ cells that vary in complexity and accuracy [5]- [14]. In this contribution we used the Sentaurus TCAD software suite [15] to numerically model and study the device's internal and external performance related to the mentioned effects for applied ITO electrodes with optimized and non-optimal electron affinities.…”
Section: Introductionmentioning
confidence: 99%