Hierarchical, Guided Self-Assembly of Preselected Carbon Nanotubes for the Controlled Fabrication of CNT Structures by Electrooxidative Nanolithography

Druzhinina, Tamara S.; Höppener, Christiane; Hoeppener, Stephanie; Schubert, Ulrich S.

doi:10.1021/la4000878

Cited by 14 publications

(15 citation statements)

References 37 publications

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“…However, the generality and robustness of the underlying chemical process (anodic oxidation) has transformed Dagata's observation into a reliable a versatile nanolithography approach for patterning and device fabrication 42 . Nanopatterning examples range from the generation of arrays of sub-micrometre lines and dots on crystalline surfaces [66][67][68] , self-assembled monolayers [69][70][71] , polymers 72 to the fabrication of nanoscale templates for the growth of single molecule magnets 73 , proteins 6 , nanoparticles [74][75][76] to the directed self-assembly of block co-polymers 77 , polymer brush nanostructures 78 , carbon nanotubes 79 or semiconductor nanostructures 80 . Examples of nanoscale devices and prototypes include, among others, single photon detectors 81 , photonic nanocavities 82 , quantum devices such as quantum point contacts [83][84] , dots 85,86 , rings 87 and several graphene devices [89][90][91][92] .…”

Section: Oxidation Splmentioning

confidence: 99%

Advanced scanning probe lithography

2014

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The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning capabilities that are unmatched by other lithographic techniques. However, the limited throughput of scanning probe lithography has prevented their exploitation in technological applications. Here, we review the fundamentals of scanning probe lithography and its use in materials science and nanotechnology. We focus on the methods and processes that offer genuinely lithography capabilities such as those based on thermal effects, chemical reactions and voltage-induced processes. Published in:Nature Nanotechnology 9, 577-587 (2014) Progress in nanotechnology depends on the capability to fabricate, position, and interconnect nanometre-scale structures. A variety of materials and systems such as nanoparticles, nanowires, two-dimensional materials like graphene and transition metal dichalcogenides, plasmonics materials, conjugated polymers and organic semiconductors are finding applications in nanoelectronics, nanophotonics, organic electronics and biomedical applications. The success of many of the above applications relies on the existence of suitable nanolithography approaches. However, patterning materials with nanoscale features aimed at improving integration and device performance poses several challenges. The limitations of conventional lithography techniques related to resolution, operational costs and lack of flexibility to pattern organic and novel materials have motivated the development of unconventional fabrication methods [1][2][3] .Since the first patterning experiments performed with a scanning probe microscope in the late 80s, scanning probe lithography (SPL) has emerged as an alternative lithography for academic research that combines nanoscale feature-size, relatively low technological requirements and the ability to handle soft matter from small organic molecules to proteins and polymers. Scanning probe lithography experiments have provided striking examples of its capabilities such as the ability to pattern 3D structures with nanoscale features 4 , the fabrication of the smallest field-effect transistor 5 or the patterning of proteins with 10 nm feature size 6 . Figure 1a shows a general scheme of SPL operation. There is a variety of approaches to modify a material in a probe-surface interface which have generated several SPL methods. Scanning probe lithographies can be either classified by emphasizing the distinction between the general nature of the process, chemical versus physical, or by considering if SPL implies the removal or addition of material. However, we consider it is more inclusive and systematic to classify the different SPL methods in terms of the driving mechanisms used in the patterning process, namely thermal, electrical, mechanical and diffusive methods (Fig. 1b). Challenges in nanoscale lithographyThe workhorse of large volume CMOS fabrication, o...

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Section: Oxidation Splmentioning

confidence: 99%

Advanced scanning probe lithography

2014

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“…Achieving a narrow pitch is an effective method to increase the SWNT density. As a result, ultra‐high resolution lithographic patterning, such as electron beam lithography, tip electrooxidative nanolithography, was applied to construct SAM patterns and combined with selective chemical functionalization, resulting in a lateral resolution of 100 nm and even 10 nm. However, the efficiency is low.…”

Section: Self‐assemblymentioning

confidence: 99%

Recent Progress in the Preparation of Horizontally Ordered Carbon Nanotube Assemblies from Solution

Zhang

Cui

Wang

et al. 2018

Physica Status Solidi (a)

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Carbon nanotubes (CNTs) has been reported for nearly 30 years, but commercial applications is rarely reported. Some reasons for this are related to the CNT properties, especially the electronic properties. Approximately 67% of semiconducting CNTs and 33% of metallic CNTs is usually achieved via a normal synthesis. However, it is difficult to implement a large-scale, ordered assembly of the CNTs. Currently, there are two mainstream methods for obtaining CNTs arrays. Although great progress has been made with direct growth methods using special techniques, there is still room to simultaneously increase both the density and purity. With the development of purification technology, solution assembly methods has attracted tremendous attention because of their ease of processability, low cost of fabrication, and ability to cover large areas at room temperature. In this review, we highlight solution assembly methods and divide the existing methods into three categories. In each category, we give a detailed description of the specific method including the mechanism, an illustration of the process, achievements, advantages, and disadvantages. Finally, the development trends and the research frontier according to our own understanding is described. In this review, a valuable reference for scholars engaged in related research is provided.

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“…In the present study, n ‐octadecyltrichlorosilane (OTS) SAMs were used to functionalize graphene oxide and to generate a chemically active surface pattern by electrooxidative lithography. Electrooxidative lithography has been used to chemically pattern self‐assembled monolayers with nanometer resolution . Surface modification can be followed by the assembly of functional molecules, complexes, and particles, which also enables the targeted, sequential construction of functional device features.…”

Section: Introductionmentioning

confidence: 99%

Site‐Specific Chemical Surface Functionalization and Electronic Patterning of Graphene by Electrooxidative Lithography

Hoeppener

Schubert

2016

ChemPhysChem

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The combination of different properties being manipulated on nanomaterials is one of the challenges in nanotechnology research. In particular, the possibility to tailor the electronic and chemical properties offers promising possibilities for the design of functional nanostructures. Herein, we report an approach that permits control of these properties on the basis of electrooxidative lithography to structure reduced graphene oxide functionalized with a self-assembled monolayer of n-octadecyltrichlorosilane. The electrochemical oxidation process first induces the formation of polar acid groups on the monolayer, which can be used to covalently bind nanoparticles and molecules and, secondly, also allows the reoxidation of the underlying reduced graphene oxide. As such, the chemical signature as well as the electronic properties of the substrate can be tailored on the micro- and nanometer scale. Details on the oxidation of the monolayer as well as thorough characterization of the electronic properties will be presented. Finally, the approach is used to demonstrate the fabrication of a sensitive glucose sensor device.

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Hierarchical, Guided Self-Assembly of Preselected Carbon Nanotubes for the Controlled Fabrication of CNT Structures by Electrooxidative Nanolithography

Cited by 14 publications

References 37 publications

Advanced scanning probe lithography

Advanced scanning probe lithography

Recent Progress in the Preparation of Horizontally Ordered Carbon Nanotube Assemblies from Solution

Site‐Specific Chemical Surface Functionalization and Electronic Patterning of Graphene by Electrooxidative Lithography

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