2015
DOI: 10.1002/chem.201503632
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Hierarchical Pore Development by Plasma Etching of Zr‐Based Metal–Organic Frameworks

Abstract: The typically stable Zr-based metal-organic frameworks (MOFs) UiO-66 and UiO-66-NH2 were treated with tetrafluoromethane (CF4 ) and hexafluoroethane (C2 F6 ) plasmas. Through interactions between fluoride radicals from the perfluoroalkane plasma and the zirconium-oxygen bonds of the MOF, the resulting materials showed the development of mesoporosity, creating a hierarchical pore structure. It is anticipated that this strategy can be used as a post-synthetic technique for developing hierarchical networks in a v… Show more

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Cited by 39 publications
(36 citation statements)
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“…This stabilization was linked to strong adsorption of PFH and the reaction of CF 3 radical species in the cavities that prevented the formation of destructive water clusters. In a second study, the highly stable zirconium BDC framework UiO‐66 was used to rationalize the influence of plasma power and exposure time on the resulting material properties (5–60 min, 10–75 W and 30 Pa) . Next to the expected hydrophobization of the material, the progressive development of mesopores in the framework was observed (Figure ).…”
Section: Steps Forward In Vapor Depositionmentioning
confidence: 99%
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“…This stabilization was linked to strong adsorption of PFH and the reaction of CF 3 radical species in the cavities that prevented the formation of destructive water clusters. In a second study, the highly stable zirconium BDC framework UiO‐66 was used to rationalize the influence of plasma power and exposure time on the resulting material properties (5–60 min, 10–75 W and 30 Pa) . Next to the expected hydrophobization of the material, the progressive development of mesopores in the framework was observed (Figure ).…”
Section: Steps Forward In Vapor Depositionmentioning
confidence: 99%
“…The treated material displays a significantly higher contact angle. b) Development of mesopores in the UiO‐66 framework by plasma etching (reproduced from reference ).…”
Section: Steps Forward In Vapor Depositionmentioning
confidence: 99%
“…Decoste used to modify Zr-based MOFs by plasma in order to develop hierarchical pore structures. [71] As a consequence, the UiO-66 series of MOFs were etched by plasma with perfluoroalkanes and showed enhanced mass transferability toward detoxification reaction.…”
Section: Plasma Engravingmentioning
confidence: 99%
“…Plasma etched UiO-66, [71] CUMSs enriched ZIF-67. [14] Etched MOF for exposing This project aims to develop the design strategies of MOF-derived catalysts in order to move beyond the shortcoming of MOFs (e.g., poor conductivity, insufficient CUMSs exposure), at the same time, the electro-catalytic performance can benefit from their outstanding properties (e.g., atomically 36 dispersed metal centres, porous structure).…”
Section: Plasma Engravingmentioning
confidence: 99%
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