“…[1,2] When the fluorine-containing gas and additional oxygen are mixed into the inert gas, the generating plasma has the capability to etch quartz and other Si-based materials without producing mechanical damage, hence the microwave plasma jet can be employed for microfabrication of optics. [3][4][5][6] In the plasma etching processing of optics, the plasma jet morphology is critical for the processing accuracy and efficiency of optics, especially for optics with complex microstructure, because the length-diameter ratio of the plasma jet determines the actual processing resolution. However, due to the addition of fluorine-containing gas and oxygen, the working gas containing such molecular gas could be excited vibrationally or rotationally, ionized, or dissociated to form different radicals, causing the stability and controllability of the plasma jet to decrease.…”