2006 IEEE MTT-S International Microwave Symposium Digest 2006
DOI: 10.1109/mwsym.2006.249705
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High-Aspect-Ratio SOI Vibrating Micromechanical Resonators and Filters

Abstract: -This paper presents a review of single crystal silicon bulk acoustic wave resonators and filters. Silicon-oninsulator (SOI) substrates are utilized to implement high quality factor (Q) integrated silicon resonators with capacitive and/or piezoelectric transducers. These resonators cover a wide range of frequencies including HF, VHF and UHF.Index Terms -Micromechanical resonators, SOI, micromechanical filters, bulk acoustic wave resonator, MEMS.

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Cited by 13 publications
(8 citation statements)
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“…The high motional resistance of several hundred kΩ to several MΩ is ascribed to the limited electromechanical coupling coefficient of the capacitive transduction. There are several methods to decrease the motional resistance, such as decreasing the spacing gap 43 , filling the gap with high-κ solid dielectric materials 44,45 , and increasing the transduction area 46 .…”
Section: Discussionmentioning
confidence: 99%
“…The high motional resistance of several hundred kΩ to several MΩ is ascribed to the limited electromechanical coupling coefficient of the capacitive transduction. There are several methods to decrease the motional resistance, such as decreasing the spacing gap 43 , filling the gap with high-κ solid dielectric materials 44,45 , and increasing the transduction area 46 .…”
Section: Discussionmentioning
confidence: 99%
“…Interestingly, this defies the expectation of material loss theory [21]- [23], which predicts that the phononphonon interaction-constrained f · Q product of AlN material should only be about two times lower than that of silicon, with a theoretically expected Q on the order of 25,000 at 1 GHz [24]. Indeed, while measured Q's for polysilicon (e.g., Q = 161, 000 at 61.9 MHz [25]) or single-crystal silicon (e.g., Q = 77, 000 at 85.9MHz [26]) resonators have approached theoretical prediction, those for attached-electrode AlN resonators demonstrated so far fall far behind it. This large deviation is unlikely due to the difference between material properties of single-crystal AlN used for theory and sputtered AlN used in measurement, given the fact that the measured Q of a thickness-mode FBAR constructed of epitaxial singlecrystal AlN deposited at 1200-1300°C via MOCVD (Metal Organic Chemical Vapor Deposition) on a SiC wafer [27] is essentially the same Q∼1,000 as measured for FBARs constructed of sputtered AlN.…”
Section: Metal Electrode-induced Degradationmentioning
confidence: 99%
“…1 L m C m (26) Note that (25) increases as the air gap spacings increase. This upward frequency shift derives from the reactance change introduced by the air gaps [39] and should not be confused with the upward frequency shift caused by elimination of electrode mass loading when electrodes are separated from the piezoelectric material.…”
Section: Motional-to-static Capacitance Ratiomentioning
confidence: 99%
“…Capacitive coupled-resonator filters have proved to be reliable in providing excellent selectivity fueled by minimal acoustic loss [1, 2]. Unfortunately, these devices usually suffer from high IL if terminated to 50 Ω.…”
Section: Introductionmentioning
confidence: 99%